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Hang-Kyu Kang ◽  
Dae-Kyoung Kim ◽  
Kwang-Sik Jeong ◽  
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Thermal Stability ◽  
Electrical Properties ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
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Structural And Electrical Properties

scholarly journals Electrical properties and thermal stability in stack structure of HfO2/Al2O3/InSb by atomic layer deposition

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Hang-Kyu Kang ◽  
Yu-Seon Kang ◽  
Kwang-Sik Jeong ◽  
Youngseo An ◽  
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Jin-Hyock Kim ◽  
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Bo-Eun Park ◽  
Yujin Lee ◽  
Il-Kwon Oh ◽  
Wontae Noh ◽  
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Thin Films ◽  
Electrical Properties ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
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Structural And Electrical Properties

Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition

2019 ◽  
Vol 97 ◽  
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Author(s):  
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Filippo Giannazzo ◽  
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Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
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Structural And Electrical Properties
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