Kinetic and Mechanistic Studies of the Thermal Decomposition of Ti(N(CH3)2)4during Chemical Vapor Deposition by in Situ Molecular Beam Mass Spectrometry

2001 ◽  
Vol 13 (12) ◽  
pp. 4655-4660 ◽  
Author(s):  
Edward T. Norton ◽  
Carmela Amato-Wierda
Keyword(s):  
Mass Spectrometry ◽  
Thermal Decomposition ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Molecular Beam ◽  
Chemical Vapor ◽  
Mechanistic Studies ◽  
Molecular Beam Mass Spectrometry

scholarly journals Molecular Beam Mass Spectrometry Studies of Chemical Vapor Deposition of Diamond

1994 ◽  
Vol 33 (Part 1, No. 4B) ◽  
pp. 2231-2239 ◽  
Author(s):  
Wen L. Hsu ◽  
Mark C. McMaster ◽  
Michael E. Coltrin ◽  
David S. Dandy
Keyword(s):  
Mass Spectrometry ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Molecular Beam ◽  
Chemical Vapor ◽  
Molecular Beam Mass Spectrometry

Using Molecular-Beam Mass Spectrometry to Study the Pecvd of Diamondlike Carbon Films

1993 ◽  
Vol 334 ◽  
Author(s):  
I.B. Graff ◽  
R.A. Pugliese ◽  
P.R. Westmoreland
Keyword(s):  
Mass Spectrometry ◽  
Vapor Deposition ◽  
Molecular Beam ◽  
Film Growth ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Total Flow ◽  
Measured Concentration ◽  
Molecular Beam Mass Spectrometry ◽  
Diamondlike Carbon

AbstractMolecular-beam mass spectrometry has been used to study plasma-enhanced chemical vapor deposition (PECVD) of diamondlike carbon films. A threshold-ionization technique was used to identify and quantify species in the plasma. Mole fractions of H, H2, CH4, C2H2, C2H6 and Ar were measured in an 83.3% CH4/Ar mixture at a pressure of 0.1 torr and a total flow of 30 sccm. Comparisons were made between mole fractions measured at plasma powers of 25W and 50W. These results were compared to measured concentration profiles and to film growth rates.

scholarly journals In Situ Investigation of the Thermal Decomposition of Cl4 (CH3 CN)W(N i Pr) During Simulated Chemical Vapor Deposition

2019 ◽  
Vol 2019 (32) ◽  
pp. 3661-3666 ◽  
Author(s):  
Michelle M. Nolan ◽  
Seo Young Kim ◽  
Arijit Koley ◽  
Tim Anderson ◽  
Lisa McElwee-White
Keyword(s):  
Thermal Decomposition ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
In Situ Investigation

Molecular Beam Mass Spectrometry Studies of the Thermal Decomposition of Tetrakis(dimethylamino)Titanium

1999 ◽  
Vol 606 ◽  
Author(s):  
Carmela C. Amato-Wierda ◽  
Edward T. Norton ◽  
Derk A. Wierda
Keyword(s):  
Mass Spectrometry ◽  
Gas Phase ◽  
Vapor Deposition ◽  
Molecular Beam ◽  
Flow Reactor ◽  
Chemical Vapor ◽  
Molecular Beam Mass Spectrometry ◽  
Gas Phase Chemistry ◽  
Temperature Rate ◽  
Phase Chemistry

AbstractTetrakis(dimethylamino)titanium (TDMAT) is an important precursor for TiN, TiCN, and TiSiN thin films in chemical vapor deposition. In order to better understand how the gas phase chemistry influences the formation of these films, the decomposition of TDMAT has been studied in a high-temperature flow reactor (HTFR) by molecular beam mass spectrometry (MBMS). Two kinetic regimes have been observed as a function of temperature. Rate expressions and mechanistic implications will be presented. Further studies are in progress to identify the gas phase species relevant to the decomposition mechanism of TDMAT.

Sign in / Sign up

Export Citation Format

Share Document