Reversible Tuning of the Surface Chemical Reactivity of Titanium Nitride and Nitride−Carbide Diffusion Barrier Thin Films

2009 ◽  
Vol 21 (21) ◽  
pp. 5163-5169 ◽  
Author(s):  
Juan Carlos F. Rodríguez-Reyes ◽  
Chaoying Ni ◽  
Holt P. Bui ◽  
Thomas P. Beebe ◽  
Andrew V. Teplyakov
Keyword(s):  
Thin Films ◽  
Titanium Nitride ◽  
Diffusion Barrier ◽  
Chemical Reactivity ◽  
Surface Chemical ◽  
Surface Chemical Reactivity

Exploring the Surface Chemical Reactivity of Single Crystals of Binary and Ternary Bismuth Chalcogenides

2014 ◽  
Vol 118 (37) ◽  
pp. 21517-21522 ◽  
Author(s):  
A. Politano ◽  
M. Caputo ◽  
S. Nappini ◽  
F. Bondino ◽  
E. Magnano ◽  
...  
Keyword(s):  
Single Crystals ◽  
Chemical Reactivity ◽  
Surface Chemical ◽  
Bismuth Chalcogenides ◽  
Surface Chemical Reactivity

Deposition of Copper Thin Films on Titanium Nitride Layer Prepared by Flow Modulation CVD Technology

2004 ◽  
Vol 449-452 ◽  
pp. 457-460
Author(s):  
Nam Ihn Cho ◽  
Min Chul Kim ◽  
Kyung Hwa Rim ◽  
Ho Jung Chang ◽  
Keeyoung Jun ◽  
...  
Keyword(s):  
Thin Films ◽  
Titanium Nitride ◽  
Diffusion Barrier ◽  
High Vacuum ◽  
Reduction Process ◽  
Chemical Vapor ◽  
Barrier Properties ◽  
Nitride Layer ◽  
Layer Growth ◽  
Flow Modulation

Copper (Cu) thin films have been deposited onto titanium nitride (TiN) layer which was previously prepared by flow modulation chemical vapor deposition (FMCVD technology. The diffusion barrier properties of the TiN layer to Cu have been studied depending upon the post-annealing and the sample preparation conditions of the TiN layer. The Cu deposition has performed by RF magnetron sputtering with 5N target in the high vacuum ambient. The FMCVD process has carried out in a single CVD chamber by switching TiCl4flow to the argon flow cyclically, which creates sequential deposition of TiN layer and chlorine reduction process. The higher flow modulation cycle and Ar purge time during the TiN layer growth have been observed to provide the better diffusion barrier property in Auger depth profile and X-ray diffraction analysis.

scholarly journals Spectroscopic Link between Adsorption Site Occupation and Local Surface Chemical Reactivity

2004 ◽  
Vol 93 (4) ◽  
Author(s):  
A. Baraldi ◽  
S. Lizzit ◽  
G. Comelli ◽  
M. Kiskinova ◽  
R. Rosei ◽  
...  
Keyword(s):  
Chemical Reactivity ◽  
Adsorption Site ◽  
Surface Chemical ◽  
Local Surface ◽  
Site Occupation ◽  
Surface Chemical Reactivity
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