Toward an Atomic-Scale Understanding of Electrochemical Interface Structure and Dynamics

2019 ◽  
Vol 141 (12) ◽  
pp. 4777-4790 ◽  
Author(s):  
Olaf M. Magnussen ◽  
Axel Groß
Author(s):  
Jian Zhang ◽  
Weizhen Wang ◽  
Tianlin Wang ◽  
Lili Jiang ◽  
Nan Wang ◽  
...  

2019 ◽  
Vol 21 (24) ◽  
pp. 13099-13108 ◽  
Author(s):  
Susanna Monti ◽  
Jiya Jose ◽  
Athira Sahajan ◽  
Nandakumar Kalarikkal ◽  
Sabu Thomas

Functionalized gold nanoparticles for antibiotic drug delivery: from the nanoscale to the atomic scale.


2020 ◽  
Vol 14 (6) ◽  
pp. 2000054
Author(s):  
Lei Jin ◽  
Michael Zapf ◽  
Martin Stübinger ◽  
Martin Kamp ◽  
Michael Sing ◽  
...  

1997 ◽  
Vol 51 (3) ◽  
pp. 323-331 ◽  
Author(s):  
R. Georgiadis ◽  
S. G. Lambrakos ◽  
P. P. Trzaskoma-Paulette

We present a general approach for establishing correlations between the optical second-harmonic (SH) response generated from a metal/electrolyte interface and the interface structure. Our approach entails the construction of a response function for optical second-harmonic generation (SHG) from the metal surface in the presence of an electrolyte and an applied electrochemical field. The response function approach, a powerful and general method, is developed here for the first time for SHG data. Here, the response function describes the nonlinear optical response of a mesoscopic region of the surface to an applied static mesoscopic electric field and is a characterization of how the electrostatic nature of the surface responds to changes in the concentration and composition of the electrolyte. We construct the response function from experimental measurements of the SH response and from models representing known interface structure. A significant aspect of our approach is that it combines, through the modification of the response function, existing models of metal-interface structure with models for mechanisms of SHG response. Our approach provides, therefore, a framework for correlating existing and emerging models of the double layer with optical experimental measurements. Case study analyses of prototype interface systems are presented here, demonstrating applications of our approach.


1996 ◽  
Vol 448 ◽  
Author(s):  
A. Y. Lew ◽  
S. L. Zuo ◽  
E. T. Yu ◽  
R. H. Miles

AbstractWe have used cross-sectional scanning tunneling microscopy to study the atomic-scale interface structure of InAs/Ga, _In.xSb superlattices grown by molecular-beam epitaxy. Detailed, quantitative analysis of interface profiles obtained from constant-current images of both (110) and (1ī0) cross-sectional planes of the superlattice indicates that interfaces in the (1ī0) plane exhibit a higher degree of interface roughness than those in the (110) plane, and that the Ga1-xln xAs interfaces are rougher than the InAs-on-Gal1-xInxSb interfaces. The roughness data are consistent with anisotropy in interface structure arising from anisotropic island formation during growth, and in addition with a growth-sequence-dependent interface asymmetry resulting from differences in interfacial bond structure between the superlattice layers. Roughness data are compared with measurements of anisotropy in low-temperature Hall mobilities of the samples.


1990 ◽  
Vol 192 ◽  
Author(s):  
H. Koinuma ◽  
M. Nakano ◽  
S. Gonda

ABSTRACTThe interface structure of a-Si:H films deposited by glow discharge decomposition of Si2H6 on SnO2 was characterized on an atomic scale with the use of in situ XPS. The method analyzes the variation of the intensity of photoelectron emission originating from the bottom SnO2 layer and transmitting through the upper a-Si:H layers of various thicknesses. It was evaluated that a-Si:H was partially oxidized as it grew to a thickness of about 15 A, while the SnO2 bottom layer was reduced to metallic Sn and SnOx (0 < x < 2) states as deep as 2 A and 12 A from the interface, respectively,


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