Magnetic Properties of Polycrystalline Bismuth Ferrite Thin Films Grown by Atomic Layer Deposition

2014 ◽  
Vol 5 (24) ◽  
pp. 4319-4323 ◽  
Author(s):  
Pasi Jalkanen ◽  
Vladimir Tuboltsev ◽  
Benoît Marchand ◽  
Alexander Savin ◽  
Manjunath Puttaswamy ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Atomic Layer Deposition ◽  
Bismuth Ferrite ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Ferrite Thin Films

Low Temperature Stabilization of Nanoscale Epitaxial Spinel Ferrite Thin Films by Atomic Layer Deposition

2014 ◽  
Vol 24 (34) ◽  
pp. 5368-5374 ◽  
Author(s):  
Mariona Coll ◽  
Josep M. Montero Moreno ◽  
Jaume Gazquez ◽  
Kornelius Nielsch ◽  
Xavier Obradors ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Spinel Ferrite ◽  
Atomic Layer ◽  
Temperature Stabilization ◽  
Layer Deposition ◽  
Ferrite Thin Films

Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition

2017 ◽  
Vol 9 (42) ◽  
pp. 36980-36988 ◽  
Author(s):  
Calvin D. Pham ◽  
Jeffrey Chang ◽  
Mark A. Zurbuchen ◽  
Jane P. Chang
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition

Atomic layer deposition of void-free ZnFe2O4 thin films and their magnetic properties

2020 ◽  
Vol 709 ◽  
pp. 138206
Author(s):  
Yijun Zhang ◽  
Wei Ren ◽  
Gang Niu ◽  
Chao Li ◽  
Chenying Wang ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition

scholarly journals Atomic layer deposition of nickel–cobalt spinel thin films

2017 ◽  
Vol 46 (14) ◽  
pp. 4796-4805 ◽  
Author(s):  
D. J. Hagen ◽  
T. S. Tripathi ◽  
M. Karppinen
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Electrical And Magnetic Properties ◽  
Cobalt Spinel ◽  
Nickel Cobalt ◽  
Layer Deposition ◽  
Wide Range

Combining ALD cycles for NiO and Co3O4, (Co1−xNix)3O4 films with a wide range of electrical and magnetic properties are obtained.

Depositing High-Performance Conductive Thin Films by Using Atomic Layer Deposition

2015 ◽  
Vol 764-765 ◽  
pp. 138-142 ◽  
Author(s):  
Fa Ta Tsai ◽  
Hsi Ting Hou ◽  
Ching Kong Chao ◽  
Rwei Ching Chang
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
High Performance ◽  
Atomic Layer ◽  
Electric Properties ◽  
X Ray Diffraction ◽  
Layer Deposition ◽  
Azo Thin Film ◽  
Aluminum Doped Zinc Oxide ◽  
Conductive Thin Films

This work characterizes the mechanical and opto-electric properties of Aluminum-doped zinc oxide (AZO) thin films deposited by atomic layer deposition (ALD), where various depositing temperature, 100, 125, 150, 175, and 200 °C are considered. The transmittance, microstructure, electric resistivity, adhesion, hardness, and Young’s modulus of the deposited thin films are tested by using spectrophotometer, X-ray diffraction, Hall effect analyzer, micro scratch, and nanoindentation, respectively. The results show that the AZO thin film deposited at 200 °C behaves the best electric properties, where its resistance, Carrier Concentration and mobility reach 4.3×10-4 Ωcm, 2.4×1020 cm-3, and 60.4 cm2V-1s-1, respectively. Furthermore, microstructure of the AZO films deposited by ALD is much better than those deposited by sputtering.

scholarly journals Fabrication of GdxFeyOz films using an atomic layer deposition-type approach

CrystEngComm ◽  
2021 ◽  
Author(s):  
Pengmei Yu ◽  
Sebastian M. J. Beer ◽  
Anjana Devi ◽  
Mariona Coll
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Complex Oxide ◽  
Oxide Thin Films ◽  
Layer Deposition ◽  
Atomic Precision

The growth of complex oxide thin films with atomic precision offers bright prospects to study improved properties and novel functionalities.

Sign in / Sign up

Export Citation Format

Share Document