Initial reaction mechanism of nitrogen-doped zinc oxide with atomic layer deposition

2009 ◽  
Vol 517 (15) ◽  
pp. 4355-4359 ◽  
Author(s):  
Lin Dong ◽  
Qing-Qing Sun ◽  
Yu Shi ◽  
Hao-Wen Guo ◽  
Han Liu ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Reaction Mechanism ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Initial Reaction ◽  
Nitrogen Doped ◽  
Layer Deposition

Interfacial catalysis in and initial reaction mechanism of Al2O3 films fabricated by atomic layer deposition using non-hydrolytic sol–gel chemistry

2016 ◽  
Vol 18 (45) ◽  
pp. 31223-31229 ◽  
Author(s):  
Lina Xu ◽  
Guoyong Fang ◽  
Yanqiang Cao ◽  
Aidong Li
Keyword(s):  
Reaction Mechanism ◽  
Atomic Layer Deposition ◽  
Sol Gel ◽  
Atomic Layer ◽  
Initial Reaction ◽  
Metal Alkoxides ◽  
Alkyl Groups ◽  
Layer Deposition ◽  
Interfacial Catalysis ◽  
Al2o3 Films

DFT investigation shows that metal alkoxides can directly form M–O bonds through strong chemisorption and interfacial interactions between alkyl groups and the surface can catalyze the elimination of alkyl groups through interfacial catalysis.

Initial reaction mechanism of H-passivated Ge surface passivation by atomic layer deposition of Al2O3 and AlN

2011 ◽  
Vol 519 (18) ◽  
pp. 6000-6003 ◽  
Author(s):  
Yan Xu ◽  
Lin Chen ◽  
Qing-Qing Sun ◽  
Peng-Fei Wang ◽  
Shi-Jin Ding ◽  
...  
Keyword(s):  
Reaction Mechanism ◽  
Atomic Layer Deposition ◽  
Surface Passivation ◽  
Atomic Layer ◽  
Initial Reaction ◽  
Layer Deposition

Reaction Mechanism of Atomic Layer Deposition of Aluminum Sulfide using Trimethylaluminum and Hydrogen Sulfide

2021 ◽  
Author(s):  
Yanghong Yu ◽  
Zhongchao Zhou ◽  
Lina Xu ◽  
Yihong Ding ◽  
Guoyong Fang
Keyword(s):  
Hydrogen Sulfide ◽  
Reaction Mechanism ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Metal Sulfides ◽  
Layer Deposition

Atomic layer deposition (ALD) is a nanopreparation technique for materials and is widely used in the fields of microelectronics, energy and catalysis. ALD methods for metal sulfides, such as Al2S3...

Improving the photodetection and stability of a visible-light QDs/ZnO phototransistor via an Al2O3 additional layer

2021 ◽  
Author(s):  
Sungho Park ◽  
Byung Jun Kim ◽  
Tae Yeon Kim ◽  
Eui Young Jung ◽  
Kyu-Myung Lee ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Atomic Layer Deposition ◽  
Quantum Dot ◽  
Aluminum Oxide ◽  
Thin Layer ◽  
Visible Light ◽  
Atomic Layer ◽  
Zno Films ◽  
Additional Layer ◽  
Layer Deposition

We have developed a visible-light phototransistor with excellent photodetection characteristics and stability via atomic layer deposition (ALD) to add a thin layer of aluminum oxide (Al2O3) to quantum dot (QD)/zinc oxide (ZnO) films.

Reaction Mechanism of Pt Atomic Layer Deposition on Various Textile Surfaces

2019 ◽  
Vol 31 (21) ◽  
pp. 8995-9002
Author(s):  
Il-Kwon Oh ◽  
Jong Seo Park ◽  
Mohammad Rizwan Khan ◽  
Kangsik Kim ◽  
Zonghoon Lee ◽  
...  
Keyword(s):  
Reaction Mechanism ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition

Nitrogen-doped ZnO/n-Si core–shell nanowire photodiode prepared by atomic layer deposition

2015 ◽  
Vol 33 ◽  
pp. 154-160 ◽  
Author(s):  
Kyung Yong Ko ◽  
Hyemin Kang ◽  
Wonseon Lee ◽  
Chang-Wan Lee ◽  
Jusang Park ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Core Shell ◽  
Nitrogen Doped ◽  
Layer Deposition ◽  
Doped Zno

scholarly journals Kinetic Monte Carlo Study of the Atomic Layer Deposition of Zinc Oxide

2018 ◽  
Vol 122 (47) ◽  
pp. 27044-27058 ◽  
Author(s):  
Timo Weckman ◽  
Mahdi Shirazi ◽  
Simon D. Elliott ◽  
Kari Laasonen
Keyword(s):  
Monte Carlo ◽  
Zinc Oxide ◽  
Atomic Layer Deposition ◽  
Kinetic Monte Carlo ◽  
Monte Carlo Study ◽  
Atomic Layer ◽  
Layer Deposition
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