Dual-coupling-guided epitaxial growth of wafer-scale single-crystal WS2 monolayer on vicinal a-plane sapphire

Author(s):  
Jinhuan Wang ◽  
Xiaozhi Xu ◽  
Ting Cheng ◽  
Lehua Gu ◽  
Ruixi Qiao ◽  
...  
Carbon ◽  
2021 ◽  
Author(s):  
He Kang ◽  
Pengtao Tang ◽  
Haibo Shu ◽  
Yanhui Zhang ◽  
Yijian Liang ◽  
...  

Carbon ◽  
2021 ◽  
Author(s):  
He Kang ◽  
Pengtao Tang ◽  
Haibo Shu ◽  
Yanhui Zhang ◽  
Yijian Liang ◽  
...  

Nanomaterials ◽  
2021 ◽  
Vol 11 (3) ◽  
pp. 788
Author(s):  
Jian-Huan Wang ◽  
Ting Wang ◽  
Jian-Jun Zhang

Controllable growth of wafer-scale in-plane nanowires (NWs) is a prerequisite for achieving addressable and scalable NW-based quantum devices. Here, by introducing molecular beam epitaxy on patterned Si structures, we demonstrate the wafer-scale epitaxial growth of site-controlled in-plane Si, SiGe, and Ge/Si core/shell NW arrays on Si (001) substrate. The epitaxially grown Si, SiGe, and Ge/Si core/shell NW are highly homogeneous with well-defined facets. Suspended Si NWs with four {111} facets and a side width of about 25 nm are observed. Characterizations including high resolution transmission electron microscopy (HRTEM) confirm the high quality of these epitaxial NWs.


Author(s):  
Yanwei He ◽  
Yuan Li ◽  
Miguel Isarraraz ◽  
Pedro Pena ◽  
Jason Tran ◽  
...  

Nature ◽  
2020 ◽  
Vol 579 (7798) ◽  
pp. 219-223 ◽  
Author(s):  
Tse-An Chen ◽  
Chih-Piao Chuu ◽  
Chien-Chih Tseng ◽  
Chao-Kai Wen ◽  
H.-S. Philip Wong ◽  
...  

1999 ◽  
Vol 564 ◽  
Author(s):  
S. Ohmi ◽  
R. T. Tung

AbstractA number of modifications of the oxide-mediated epitaxy (OME) technique are presented which have enabled the growth of thick (∼25–40nm) epitaxial CoSi2 layers in a single deposition sequence. The uses of (a) a thin Ti cap, (b) a thin Ti blocking layer, (c) the codeposition of Co-rich CoSix, and (d) the co-deposition of Col−xTix. have all been shown to lead to improved epitaxial quality over the pure Co OME process, for Co thickness greater than 6nm. Essentially uniform, single crystal silicide layers of over 25nm have been grown in a single deposition step. These results are supportive of the proposed role of a diffusion barrier/kinetics retarder on the part of the interlayer in the OME and the Ti-interlayer mediated epitaxy processes.


1985 ◽  
Vol 14 (5) ◽  
pp. 633-644 ◽  
Author(s):  
M. Matloubian ◽  
M. Gershenzon

2010 ◽  
Vol 34 (2) ◽  
pp. 78-91 ◽  
Author(s):  
O. Yabuhara ◽  
Y. Nukaga ◽  
M. Ohtake ◽  
F. Kirino ◽  
M. Futamoto

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