Structural study of highly ordered mesoporous silica thin films and replicated Pt nanowires by high-resolution scanning electron microscopy (HRSEM)

2006 ◽  
Vol 16 (30) ◽  
pp. 3091 ◽  
Author(s):  
Chia-Wen Wu ◽  
Yusuke Yamauchi ◽  
Tetsu Ohsuna ◽  
Kazuyuki Kuroda
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Scanning Electron Microscopy ◽  
High Resolution ◽  
Mesoporous Silica ◽  
Structural Study ◽  
Ordered Mesoporous Silica ◽  
Ordered Mesoporous ◽  
Scanning Electron ◽  
Pt Nanowires

Direct Observation of the Outermost Surfaces of Mesoporous Silica Thin Films by High Resolution Ultralow Voltage Scanning Electron Microscopy

Langmuir ◽  
2017 ◽  
Vol 33 (9) ◽  
pp. 2148-2156 ◽  
Author(s):  
Maho Kobayashi ◽  
Kyoka Susuki ◽  
Haruo Otsuji ◽  
Yusuke Sakuda ◽  
Shunsuke Asahina ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Scanning Electron Microscopy ◽  
High Resolution ◽  
Mesoporous Silica ◽  
Direct Observation ◽  
Silica Thin Films ◽  
Voltage Scanning ◽  
Scanning Electron

scholarly journals Morphological Characterization of Ordered Meso-Pores on a Mesoporous Silica by using High-Resolution Scanning Electron Microscopy

2011 ◽  
Vol 17 (S2) ◽  
pp. 1912-1913
Author(s):  
Y Ohrai ◽  
T Sunaoshi ◽  
H Ito ◽  
T Ogashiwa ◽  
N Ikawa ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
High Resolution ◽  
Mesoporous Silica ◽  
Morphological Characterization ◽  
Scanning Electron

Extended abstract of a paper presented at Microscopy and Microanalysis 2011 in Nashville, Tennessee, USA, August 7–August 11, 2011.

Radiation damage of mesoporous silica thin films monitored by X-ray reflectivity and scanning electron microscopy

2012 ◽  
Vol 427 (1-3) ◽  
pp. 411-414 ◽  
Author(s):  
S. Dourdain ◽  
X. Deschanels ◽  
G. Toquer ◽  
C. Grygiel ◽  
I. Monnet ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Scanning Electron Microscopy ◽  
Mesoporous Silica ◽  
Radiation Damage ◽  
X Ray ◽  
Silica Thin Films ◽  
Scanning Electron

Examination of Schistosome Cercariae and Schistosomules by Scanning Electron Microscopy

1969 ◽  
Vol 27 ◽  
pp. 50-51
Author(s):  
D. Johnson ◽  
P. Moriearty
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
High Resolution ◽  
Light Microscopy ◽  
Surface Structure ◽  
Extensive Study ◽  
Scanning Microscopy ◽  
Host Parasite ◽  
Conventional Electron Microscopy ◽  
Scanning Electron

Since several species of Schistosoma, or blood fluke, parasitize man, these trematodes have been subjected to extensive study. Light microscopy and conventional electron microscopy have yielded much information about the morphology of the various stages; however, scanning electron microscopy has been little utilized for this purpose. As the figures demonstrate, scanning microscopy is particularly helpful in studying at high resolution characteristics of surface structure, which are important in determining host-parasite relationships.

High Resolution Scanning Electron Microscopy

1991 ◽  
Vol 49 ◽  
pp. 478-479
Author(s):  
David Joy ◽  
James Pawley
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Electron Beam ◽  
Electron Microscope ◽  
High Resolution ◽  
Scanning Electron Microscope ◽  
Electron Probe ◽  
Impact Point ◽  
Interaction Volume ◽  
Scanning Electron

The scanning electron microscope (SEM) builds up an image by sampling contiguous sub-volumes near the surface of the specimen. A fine electron beam selectively excites each sub-volume and then the intensity of some resulting signal is measured. The spatial resolution of images made using such a process is limited by at least three factors. Two of these determine the size of the interaction volume: the size of the electron probe and the extent to which detectable signal is excited from locations remote from the beam impact point. A third limitation emerges from the fact that the probing beam is composed of a finite number of discrete particles and therefore that the accuracy with which any detectable signal can be measured is limited by Poisson statistics applied to this number (or to the number of events actually detected if this is smaller).

Scanning Electron Microscopy and x-ray analysis of microparticles and early hydration effects

1995 ◽  
Vol 53 ◽  
pp. 692-693
Author(s):  
Yun Lu ◽  
David C. Joy
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
High Resolution ◽  
Morphological Development ◽  
Early Hydration ◽  
X Ray ◽  
Blended Cements ◽  
Powder Particles ◽  
Chemical Wastes ◽  
Scanning Electron

High resolution scanning electron microscopy (SEM) and energy dispersive x-ray analysis (EDXA) were performed to investigate microparticles in blended cements and their hydration products containing sodium-rich chemical wastes. The physical appearance of powder particles and the morphological development at different hydration stages were characterized by using high resolution SEM Hitachi S-900 and by SEM S-800 with a EDX spectrometer. Microparticles were dispersed on the sample holder and glued by 1% palomino solution. Hydrated bulk samples were dehydrated by acetone and mounted on the holder by silver paste. Both fracture surfaces and flat cutting sections of hydrating samples were prepared and examined. Some specimens were coated with an 3 nm thick Au-Pd or Cr layer to provide good conducting surfaces. For high resolution SEM S-900 observations the accelerating voltage of electrons was 1-2 KeV to protect the electron charging. Microchemical analyses were carried out by S800/EDS equipped with a LINK detector of take-off angle =40°.

Imaging magnetic microstructure with SEMPA

1993 ◽  
Vol 51 ◽  
pp. 1032-1033
Author(s):  
M. H. Kelley ◽  
J. Unguris ◽  
R. J. Celotta ◽  
D. T. Pierce
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Scanning Electron Microscopy ◽  
Sandwich Structure ◽  
Magnetic Coupling ◽  
Polarization Analysis ◽  
Secondary Electrons ◽  
Magnetic Microstructure ◽  
Escape Depth ◽  
Scanning Electron

By measuring the spin polarization of secondary electrons generated in a scanning electron microscope, scanning electron microscopy with polarization analysis (SEMPA) can directly image the magnitude and direction of a material’s magnetization. Because the escape depth of the secondaries is only on the order of 1 nm, SEMPA is especially well-suited for investigating the magnetization of ultra-thin films and surfaces. We have exploited this feature of SEMPA to study the magnetic microstrcture and magnetic coupling in ferromagnetic multilayers where the layers may only be a few atomic layers thick. For example, we have measured the magnetic coupling in Fe/Cr/Fe(100) and Fe/Ag/Fe(100) trilayers and have found that the coupling oscillates between ferromagnetic and antiferromagnetic as a function of the Cr or Ag spacer thickness.The SEMPA apparatus has been described in detail elsewhere. The sample consisted of a magnetic sandwich structure with a wedge-shaped interlayer as shown in Fig. 1.

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