scholarly journals Application of graphene–polymer composite heaters in gas-assisted micro hot embossing

RSC Advances ◽  
2017 ◽  
Vol 7 (11) ◽  
pp. 6336-6344 ◽  
Author(s):  
Cih Cheng ◽  
Kun-Cheng Ke ◽  
Sen-Yeu Yang

This paper reports a novel hot embossing technique using rapid heating and uniform pressure for replication of microstructures on polymeric substrates.

2021 ◽  
Vol 3 ◽  
Author(s):  
Evgeniia Gilshtein ◽  
Jasmine Tacneng ◽  
Sami Bolat ◽  
Galo Torres Sevilla ◽  
Yaroslav E. Romanyuk

Here, we propose a method to create a transparent security system based on printed conductive indium tin oxide (ITO)—the most widely used transparent conducting oxide material integrated into the devices with high transparency. Commonly used solution-processed ITO annealing methods are utilizing temperatures which are limiting the use of flexible polymeric substrates. Our method combines inkjet printing on flexible temperature-stable colorless polyimide (CPI) substrate with fast flash lamp annealing (FLA). In this study, millisecond pulses of visible light from a xenon lamp induce rapid heating of the ITO films up to 650°C through the light-absorbing additional layer of a colored organic dye onto printed ITO, whereas the CPI bulk never exceeds the melting point. Fabricated flexible ITO patterns on CPI film processed with the flash lamp annealing through the dye layer exhibit a transmittance of up to 85% at the wavelength of 550 nm and sheet resistance of 520 Ω/sq for a 70 nm layer thickness. With the proposed technology of our demonstrator realization—transparent glass/window or any other object such as a curved door lock can be used for integrating a touch-enabled transparent security access system, which would be completely invisible.


Nanomaterials ◽  
2021 ◽  
Vol 11 (2) ◽  
pp. 363
Author(s):  
Lihua Li ◽  
Jian Zhou

A newly developed hot embossing technique which uses the localized rapid heating of a thin carbide-bonded graphene (CBG) coating, greatly reduces the energy consumption and promotes the fabrication efficiency. However, because of the non-isothermal heat transfer process, significant geometric deviation and residual stress could be introduced. In this paper, we successfully facilitate the CBG-heating-based hot embossing into the fabrication of microlens array on inorganic glass N-BK7 substrate, where the forming temperature is as high as 800 °C. The embossed microlens array has high replication fidelity, but an obvious geometric warpage along the glass substrate also arises. Thermo-mechanical coupled finite element modelling of the embossing process is conducted and verified by the experimental results. Based on trial and error simulations, an appropriate compensation curvature is determined and adopted to modify the geometrical design of the silicon wafer mold. The warpage of the re-embossed microlens array is significantly decreased using the compensated mold, which demonstrates the feasibility of the simulation-oriented compensation scheme. Our work would contribute to improving the quality of optics embossed by this innovative CBG-heating-based hot embossing technique.


Author(s):  
A. C. Faberge

Benzylamine tartrate (m.p. 63°C) seems to be a better and more convenient substrate for making carbon films than any of those previously proposed. Using it in the manner described, it is easy consistently to make batches of specimen grids as open as 200 mesh with no broken squares, and without individual handling of the grids. Benzylamine tartrate (hereafter called B.T.) is a viscous liquid when molten, which sets to a glass. Unlike polymeric substrates it does not swell before dissolving; such swelling of the substrate seems to be a principal cause of breakage of carbon film. Mass spectroscopic examination indicates a vapor pressure less than 10−9 Torr at room temperature.


Author(s):  
T.S. Savage ◽  
R. Ai ◽  
D. Dunn ◽  
L.D. Marks

The use of lasers for surface annealing, heating and/or damage has become a routine practice in the study of materials. Lasers have been closely looked at as an annealing technique for silicon and other semiconductors. They allow for local heating from a beam which can be focused and tuned to different wavelengths for specific tasks. Pulsed dye lasers allow for short, quick bursts which can allow the sample to be rapidly heated and quenched. This short, rapid heating period may be important for cases where diffusion of impurities or dopants may not be desirable.At Northwestern University, a Candela SLL - 250 pulsed dye laser, with a maximum power of 1 Joule/pulse over 350 - 400 nanoseconds, has been set up in conjunction with a Hitachi UHV-H9000 transmission electron microscope. The laser beam is introduced into the surface science chamber through a series of mirrors, a focusing lens and a six inch quartz window.


2016 ◽  
Vol 2 (2) ◽  
pp. 37-42 ◽  
Author(s):  
E. N. Kablov ◽  
L. V. Chursova ◽  
A. N. Babin ◽  
R. R. Mukhametov ◽  
N. N. Panina

Sign in / Sign up

Export Citation Format

Share Document