scholarly journals Progress in pulsed laser deposited two-dimensional layered materials for device applications

2016 ◽  
Vol 4 (38) ◽  
pp. 8859-8878 ◽  
Author(s):  
Zhibin Yang ◽  
Jianhua Hao

Recent advances of preparing two-dimensional (2D) materials by pulsed laser deposition (PLD) are presented, including deposition processes, structure and characterization. The performance of proof-of-concept electronic or optoelectronic devices based on PLD grown 2D materials is introduced.

2019 ◽  
Vol 1 (2) ◽  
pp. 643-655 ◽  
Author(s):  
Francesco Tumino ◽  
Carlo S. Casari ◽  
Matteo Passoni ◽  
Valeria Russo ◽  
Andrea Li Bassi

Molybdenum disulphide (MoS2) is a promising material for heterogeneous catalysis and novel 2D optoelectronic devices. In this work, single-layer MoS2 is synthesized on Au(111) by pulsed laser deposition, showing the potentialities of this technique in the synthesis of high-quality 2D materials films.


2018 ◽  
Vol 2018 ◽  
pp. 1-5 ◽  
Author(s):  
Lei Jiao ◽  
Yuehui Wang ◽  
Yusong Zhi ◽  
Wei Cui ◽  
Zhengwei Chen ◽  
...  

Direct growth of uniform wafer-scale two-dimensional (2D) layered materials using a universal method is of vital importance for utilizing 2D layers into practical applications. Here, we report on the structural and transport properties of large-scale few-layer MoS2 back-gated field effect transistors (FETs), fabricated using conventional pulsed laser deposition (PLD) technique. Raman spectroscopy and transmission electron microscopy results confirmed that the obtained MoS2 layers on SiO2/Si substrate are multilayers. The FETs devices exhibit a relative high on/off ratio of 5 × 102 and mobility of 0.124 cm2V−1S−1. Our results suggest that the PLD would be a suitable pathway to grow 2D layers for future industrial device applications.


1991 ◽  
Vol 243 ◽  
Author(s):  
K. Nashimoto ◽  
D. K. Fork ◽  
F. A. Ponce ◽  
T. H. Geballe

AbstractEpitaxial growth of ferroelectric thin films on GaAs (100) by pulsed laser deposition was examined for integrated electro-optic device applications. To promote epitaxy of ferroelectrics and prevent interdiffusion, we have deposited several types of buffer layers. CeO2 reacted strongly with GaAs. Although Y203 9% stabilized-ZrO2 films showed epitaxial growth, YSZ reacted with GaAs at 780°C. MgO grew epitaxially and was stable even at 780°C. HRTEM observation showed a sharp interface between MgO and GaAs. BaTiO3 and SrTiO3 deposited on MgO/GaAs structures showed epitaxial growth. In-plane orientation was BaTiO3 [100 // MgO [100] // GaAs [100]. Epitaxial BaTiO3 films were c-axis oriented tetragonal phase and showed ferroelectric hysteresis.


2018 ◽  
Vol 668 ◽  
pp. 69-73 ◽  
Author(s):  
Kun Tian ◽  
Karthikeyan Baskaran ◽  
Ashutosh Tiwari

2019 ◽  
Vol 59 (SA) ◽  
pp. SAAC01 ◽  
Author(s):  
Hiroharu Kawasaki ◽  
Tamiko Ohshima ◽  
Yoshihito Yagyu ◽  
Takeshi Ihara ◽  
Masanori Shinohara ◽  
...  

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