scholarly journals Enhancing the water repellency of wood surfaces by atmospheric pressure cold plasma deposition of fluorocarbon film

RSC Advances ◽  
2017 ◽  
Vol 7 (46) ◽  
pp. 29159-29169 ◽  
Author(s):  
Pedro Henrique Gonzalez de Cademartori ◽  
Luc Stafford ◽  
Pierre Blanchet ◽  
Washington Luiz Esteves Magalhães ◽  
Graciela Ines Bolzon de Muniz
Keyword(s):  
Atmospheric Pressure ◽  
Cold Plasma ◽  
Plasma Deposition ◽  
Atmospheric Pressure Plasma ◽  
Water Repellency ◽  
Pressure Plasma ◽  
Wood Surfaces ◽  
Fluorocarbon Film

This study explores the fluorocarbon deposition on wood by atmospheric pressure plasma, with the focus on higher water repellency.

scholarly journals Atmospheric Pressure Plasma Deposition of TiO2: A Review

Materials ◽  
2020 ◽  
Vol 13 (13) ◽  
pp. 2931
Author(s):  
Soumya Banerjee ◽  
Ek Adhikari ◽  
Pitambar Sapkota ◽  
Amal Sebastian ◽  
Sylwia Ptasinska
Keyword(s):  
Atmospheric Pressure ◽  
Gas Flow ◽  
Plasma Deposition ◽  
Atmospheric Pressure Plasma ◽  
Cost Savings ◽  
Historical Background ◽  
Pressure Plasma ◽  
Wide Range ◽  
The Status ◽  
Deposition Techniques

Atmospheric pressure plasma (APP) deposition techniques are useful today because of their simplicity and their time and cost savings, particularly for growth of oxide films. Among the oxide materials, titanium dioxide (TiO2) has a wide range of applications in electronics, solar cells, and photocatalysis, which has made it an extremely popular research topic for decades. Here, we provide an overview of non-thermal APP deposition techniques for TiO2 thin film, some historical background, and some very recent findings and developments. First, we define non-thermal plasma, and then we describe the advantages of APP deposition. In addition, we explain the importance of TiO2 and then describe briefly the three deposition techniques used to date. We also compare the structural, electronic, and optical properties of TiO2 films deposited by different APP methods. Lastly, we examine the status of current research related to the effects of such deposition parameters as plasma power, feed gas, bias voltage, gas flow rate, and substrate temperature on the deposition rate, crystal phase, and other film properties. The examples given cover the most common APP deposition techniques for TiO2 growth to understand their advantages for specific applications. In addition, we discuss the important challenges that APP deposition is facing in this rapidly growing field.

scholarly journals Atmospheric pressure plasma deposition of antimicrobial coatings on non-woven textiles

2016 ◽  
Vol 75 (2) ◽  
pp. 24710 ◽  
Author(s):  
Anton Yu. Nikiforov ◽  
Xiaolong Deng ◽  
Iuliia Onyshchenko ◽  
Danijela Vujosevic ◽  
Vineta Vuksanovic ◽  
...  
Keyword(s):  
Atmospheric Pressure ◽  
Plasma Deposition ◽  
Atmospheric Pressure Plasma ◽  
Antimicrobial Coatings ◽  
Pressure Plasma

Application of atmospheric pressure plasma polymerization for soil guard finishing of textiles

2017 ◽  
Vol 88 (11) ◽  
pp. 1278-1289 ◽  
Author(s):  
Keiko Gotoh ◽  
Eriko Shohbuke ◽  
Gyohni Ryu
Keyword(s):  
Atmospheric Pressure ◽  
Ethylene Terephthalate ◽  
Silicon Oxide ◽  
Atmospheric Pressure Plasma ◽  
Fiber Surface ◽  
Water Repellency ◽  
Red Clay ◽  
Pressure Plasma ◽  
Poly Ethylene Terephthalate ◽  
Poly Ethylene

Surface coating by atmospheric pressure plasma jet (APPJ) polymerization was employed to achieve soil guard protection of textiles. Hexamethyldisiloxane was chosen as a precursor for depositing silicon oxide layers on the fiber surface. Plain-woven polyester and rayon filament fabrics and a geometrically simple poly (ethylene terephthalate) film were used as substrates, which were treated by the APPJ polymerization and by the commonly used two fluorochemical resins for comparison. The samples subjected to the APPJ polymerization showed superior water repellency as compared to the resin-treated samples. Interestingly, the APPJ polymerization provided oleophobicity to diiodomethane and oleophilicity to hexadecane. The deposition of model particulate soils, carbon black and red clay, on the fabrics and the film was evaluated by the surface reflectance method and by microscope image analysis, respectively. It was found that the APPJ polymerization remarkably prevented soil deposition as compared to the treatment with two fluorochemical resins. Contrary to our expectations, the APPJ polymerization did not significantly affect the removal of the particulate soils from the substrates by aqueous cleaning.

Atmospheric Pressure Plasma Deposition of Poly Lactic Acid-Like Coatings with Embedded Elastin

2014 ◽  
Vol 11 (4) ◽  
pp. 345-352 ◽  
Author(s):  
Gabriella Da Ponte ◽  
Eloisa Sardella ◽  
Fiorenza Fanelli ◽  
Sabine Paulussen ◽  
Pietro Favia
Keyword(s):  
Lactic Acid ◽  
Atmospheric Pressure ◽  
Plasma Deposition ◽  
Atmospheric Pressure Plasma ◽  
Poly Lactic Acid ◽  
Pressure Plasma

Effect of Plasma Deposition Using Low-Power/Non-thermal Atmospheric Pressure Plasma on Promoting Adhesion of Composite Resin to Enamel

2014 ◽  
Vol 34 (4) ◽  
pp. 933-947 ◽  
Author(s):  
Geum-Jun Han ◽  
Jae-Hoon Kim ◽  
Sung-No Chung ◽  
Bae-Hyeock Chun ◽  
Chang-Keun Kim ◽  
...  
Keyword(s):  
Low Power ◽  
Atmospheric Pressure ◽  
Composite Resin ◽  
Plasma Deposition ◽  
Atmospheric Pressure Plasma ◽  
Pressure Plasma

Improved GZO Thin Film Properties with SiOx Buffer Layer by Atmospheric Pressure Plasma Deposition

2014 ◽  
Vol 625 ◽  
pp. 196-200
Author(s):  
Kuo Hui Yang ◽  
Po Ching Ho ◽  
Je Wei Lin ◽  
Ta Hsin Chou ◽  
Kow Ming Chang
Keyword(s):  
Thin Film ◽  
Buffer Layer ◽  
Atmospheric Pressure ◽  
Plasma Deposition ◽  
Atmospheric Pressure Plasma ◽  
Deposition Process ◽  
Good Alternative ◽  
Pressure Plasma ◽  
Electro Optic ◽  
Single Jet

The Ga-doped zinc-oxides (GZO) as the transparency conductive oxide is the good candidate for substituting ITO. The buffer layer SiOx could improve the quality of GZO thin film. The atmospheric pressure plasma multi-jets (APPMJ) system with three jets was designed and applied for SiOx deposition process. The deposition thickness of three jets was 2.5 times higher than that of single jet, and the uniformity was less than 5% for the area 100mm2. GZO thin film with SiOx buffer layer had 3% decreases in resistivity compared to GZO thin film due to the increasing of mobility. The SiOx/glass fabricated APPMJ system will be a good alternative substrate to bare glass for producing high quality GZO film for advanced electro-optic applications.

Sign in / Sign up

Export Citation Format

Share Document