Enhancement of Electrical Performance of Atomic Layer Deposited SnO Films via Substrate Surface Engineering

2021 ◽  
Author(s):  
In-Hwan Baek ◽  
Ah-Jin Cho ◽  
Ga Yeon Lee ◽  
HeeNang Choi ◽  
Sung Ok Won ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Surface Engineering ◽  
Surface Reaction ◽  
Substrate Surface ◽  
Surface States ◽  
Atomic Layer ◽  
Electrical Performance ◽  
Layer Deposition

Atomic layer deposition (ALD) is a technique based on the surface reaction of precursors; thus, it strongly depends on the surface states of the substrate. We demonstrate significant changes in...

Atomic scale surface engineering of micro- to nano-sized pharmaceutical particles for drug delivery applications

Nanoscale ◽  
2017 ◽  
Vol 9 (32) ◽  
pp. 11410-11417 ◽  
Author(s):  
D. Zhang ◽  
M. J. Quayle ◽  
G. Petersson ◽  
J. R. van Ommen ◽  
S. Folestad
Keyword(s):  
Drug Delivery ◽  
Atomic Layer Deposition ◽  
Surface Engineering ◽  
Atomic Layer ◽  
Atomic Scale ◽  
Ambient Conditions ◽  
Surface Layers ◽  
Layer Deposition ◽  
Atomic Surface ◽  
Scale Surface

Few atomic surface layers via atomic layer deposition under near ambient conditions significantly altered dissolution and dispersion of pharmaceutical particles.

Atomic layer deposition and electrospinning as membrane surface engineering methods for water treatment: a short review

2020 ◽  
Vol 6 (7) ◽  
pp. 1765-1785
Author(s):  
Jieun Lee ◽  
In S. Kim ◽  
Moon-Hyun Hwang ◽  
Kyu-Jung Chae
Keyword(s):  
Water Treatment ◽  
Atomic Layer Deposition ◽  
Surface Engineering ◽  
Membrane Surface ◽  
Atomic Layer ◽  
Short Review ◽  
Review Article ◽  
Future Perspectives ◽  
Layer Deposition ◽  
Insight Into

This review article provides a summary of the application of ALD and electrospinning in membrane processes for water treatment and insight into the technological challenges and future perspectives for their wider application in the membrane industry.

Passivation of surface states by ALD-grown TiO2 overlayers on Ta3N5 anodes for photoelectrochemical water oxidation

2016 ◽  
Vol 52 (57) ◽  
pp. 8806-8809 ◽  
Author(s):  
Peng Zhang ◽  
Tuo Wang ◽  
Jinlong Gong
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Water Oxidation ◽  
Surface States ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Photoelectrochemical Water Oxidation

This paper describes the fabrication of TiO2 overlayers by atomic layer deposition to passivate the surface states on Ta3N5 thin film anodes for photoelectrochemical water oxidation.

Controlling the electronic properties of SWCNT FETs via modification of the substrate surface prior to atomic layer deposition of 10 nm thick Al2O3film

2013 ◽  
Vol 24 (45) ◽  
pp. 455701
Author(s):  
Joonsung Kim ◽  
Jangyeol Yoon ◽  
Junhong Na ◽  
Seongmin Yee ◽  
Gyu Tae Kim ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Electronic Properties ◽  
Substrate Surface ◽  
Atomic Layer ◽  
Layer Deposition
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