scholarly journals DNN‐aided read‐voltage threshold optimization for MLC flash memory with finite block length

2021 ◽  
Author(s):  
Cheng Wang ◽  
Kang Wei ◽  
Lingjun Kong ◽  
Long Shi ◽  
Zhen Mei ◽  
...  
Keyword(s):  
Flash Memory ◽  
Block Length ◽  
Voltage Threshold ◽  
Threshold Optimization

Novel Three Dimensional (3D) NAND Flash Memory Array Having Tied Bit-line and Ground Select Transistor (TiGer)

2012 ◽  
Vol E95.C (5) ◽  
pp. 837-841 ◽  
Author(s):  
Se Hwan PARK ◽  
Yoon KIM ◽  
Wandong KIM ◽  
Joo Yun SEO ◽  
Hyungjin KIM ◽  
...  
Keyword(s):  
Flash Memory ◽  
Three Dimensional ◽  
Nand Flash ◽  
Nand Flash Memory ◽  
Memory Array

Simulation of Retention Characteristics in Double-Gate Structure Multi-Bit SONOS Flash Memory

2009 ◽  
Vol E92-C (5) ◽  
pp. 659-663 ◽  
Author(s):  
Doo-Hyun KIM ◽  
Il Han PARK ◽  
Seongjae CHO ◽  
Jong Duk LEE ◽  
Hyungcheol SHIN ◽  
...  
Keyword(s):  
Flash Memory ◽  
Double Gate ◽  
Gate Structure ◽  
Retention Characteristics

Adaptive Interference Mitigation for Multilevel Flash Memory Devices

2011 ◽  
Vol E94-A (11) ◽  
pp. 2453-2457
Author(s):  
Myeongwoon JEON ◽  
Kyungchul KIM ◽  
Sungkyu CHUNG ◽  
Seungjae CHUNG ◽  
Beomju SHIN ◽  
...  
Keyword(s):  
Flash Memory ◽  
Interference Mitigation ◽  
Memory Devices

Analysis of Leakage Failures in Flash Memory Devices and Root Cause Identification

2000 ◽  
Author(s):  
J. N. C. de Luna ◽  
M. O. del Fierro ◽  
J. L. Muñoz
Keyword(s):  
Flash Memory ◽  
Electromagnetic Interference ◽  
Yield Loss ◽  
High Amplitude ◽  
Physical Analysis ◽  
Input Buffer ◽  
Automated Test Equipment ◽  
Root Cause ◽  
Root Cause Identification ◽  
Test Process

Abstract An advanced flash bootblock device was exceeding current leakage specifications on certain pins. Physical analysis showed pinholes on the gate oxide of the n-channel transistor at the input buffer circuit of the affected pins. The fallout contributed ~1% to factory yield loss and was suspected to be caused by electrostatic discharge or ESD somewhere in the assembly and test process. Root cause investigation narrowed down the source to a charged core picker inside the automated test equipment handlers. By using an electromagnetic interference (EMI) locator, we were able to observe in real-time the high amplitude electromagnetic pulse created by this ESD event. Installing air ionizers inside the testers solved the problem.

Carrier Profiling of the 10-nm-order Structure in a 3D Flash Memory Cell Using Scanning Nonlinear Dielectric Microscopy

2019 ◽  
Author(s):  
Jun Hirota ◽  
Ken Hoshino ◽  
Tsukasa Nakai ◽  
Kohei Yamasue ◽  
Yasuo Cho
Keyword(s):  
Spatial Resolution ◽  
Flash Memory ◽  
Analytical Techniques ◽  
Memory Cell ◽  
Memory Device ◽  
Floating Gate ◽  
Order Structure ◽  
Carrier Distribution ◽  
Nonlinear Dielectric ◽  
Flash Memory Cell

Abstract In this paper, the authors report their successful attempt to acquire the scanning nonlinear dielectric microscopy (SNDM) signals around the floating gate and channel structures of the 3D Flash memory device, utilizing the custom-built SNDM tool with a super-sharp diamond tip. The report includes details of the SNDM measurement and process involved in sample preparation. With the super-sharp diamond tips with radius of less than 5 nm to achieve the supreme spatial resolution, the authors successfully obtained the SNDM signals of floating gate in high contrast to the background in the selected areas. They deduced the minimum spatial resolution and seized a clear evidence that the diffusion length differences of the n-type impurity among the channels are less than 21 nm. Thus, they concluded that SNDM is one of the most powerful analytical techniques to evaluate the carrier distribution in the superfine three dimensionally structured memory devices.

Effectiveness of Nanoprober in Detecting Single/Multiple Bit Flash Data Gain & Data Loss Failures

2009 ◽  
Author(s):  
Rajesh Medikonduri
Keyword(s):  
Flash Memory ◽  
Data Loss ◽  
Voltage Contrast

Abstract This paper discusses the physics, definitions, and nanoprobing flow of a flash bit memory. In addition, a case study showing the effectiveness of nanoprobing in detecting the Single Bit Fail Data Gain and Data Loss in Flash Memory is also discussed. The paper also includes cases where no passive voltage contrast was observed at the SEM and no leakage was observed at AFM, yet the units failing SBF DG, SBF DL and depletion, were detected by nanoprobing of the single bit. The major finding of this paper is a way to resolve data gain, data loss, and depletion failures of flash memory by nanoprobing procedure, despite no PVC seen at the SEM and no leakage seen at the AFM.

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