Simulation of Retention Characteristics in Double-Gate Structure Multi-Bit SONOS Flash Memory

2009 ◽  
Vol E92-C (5) ◽  
pp. 659-663 ◽  
Author(s):  
Doo-Hyun KIM ◽  
Il Han PARK ◽  
Seongjae CHO ◽  
Jong Duk LEE ◽  
Hyungcheol SHIN ◽  
...  
Keyword(s):  
Flash Memory ◽  
Double Gate ◽  
Gate Structure ◽  
Retention Characteristics

Fabrication and characterization of fin SONOS flash memory with separated double-gate structure

2008 ◽  
Vol 52 (10) ◽  
pp. 1498-1504 ◽  
Author(s):  
Jang-Gn Yun ◽  
Yoon Kim ◽  
Il Han Park ◽  
Jung Hoon Lee ◽  
Sangwoo Kang ◽  
...  
Keyword(s):  
Flash Memory ◽  
Double Gate ◽  
Gate Structure ◽  
Fabrication And Characterization

Body-tied double-gate SONOS flash (omega flash) memory device built on bulk Si wafer

2004 ◽  
Author(s):  
Il Hwan Cho ◽  
Tai-Su Park ◽  
Si Young Choi ◽  
Jong Duk Lee ◽  
Jong-Ho Lee
Keyword(s):  
Flash Memory ◽  
Memory Device ◽  
Double Gate ◽  
Si Wafer

The Effect of Trapped Charge Distributions on Data Retention Characteristics of nand Flash Memory Cells

2007 ◽  
Vol 28 (8) ◽  
pp. 750-752 ◽  
Author(s):  
M. Park ◽  
Kangdeog Suh ◽  
Keonsoo Kim ◽  
S. Hur ◽  
K. Kim ◽  
...  
Keyword(s):  
Flash Memory ◽  
Memory Cells ◽  
Nand Flash ◽  
Nand Flash Memory ◽  
Data Retention ◽  
Charge Distributions ◽  
Retention Characteristics ◽  
Trapped Charge

High speed sub-halfmicron flash memory technology with simple stacked gate structure cell

2002 ◽  
Author(s):  
S. Mori ◽  
E. Sakagami ◽  
Y. Yamaguchi ◽  
E. Kamiya ◽  
M. Tanimoto ◽  
...  
Keyword(s):  
Flash Memory ◽  
High Speed ◽  
Gate Structure
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