Electronic properties of thin SiO2 films deposited at low temperatures by new ECR microwave PECVD process
1993 ◽
Vol 11
(6)
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pp. 2945-2949
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Keyword(s):
1991 ◽
Vol 138
(1)
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pp. 325-326
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2007 ◽
Vol 156-158
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pp. 20-24
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Keyword(s):
1989 ◽
Vol 138
(6-7)
◽
pp. 313-317
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1990 ◽
Vol 19
(12)
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pp. 1411-1415
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Keyword(s):
2016 ◽
Vol 182
(5-6)
◽
pp. 185-191
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