Modeling of current-voltage characteristics of metal/ultra-thin oxide/semiconductor structures

2000 ◽  
Vol 9 (3) ◽  
pp. 239-246 ◽  
Author(s):  
Y. Khlifi ◽  
K. Kassmi ◽  
L. Roubi ◽  
R. Maimouni
Keyword(s):  
Oxide Semiconductor ◽  
Semiconductor Structures ◽  
Current Voltage ◽  
Current Voltage Characteristics ◽  
Thin Oxide

scholarly journals FRACTAL PROPERTIES OF MICROPLASMA BREAKDOWN AND STRUCTURAL HETEROGENEITY OF SEMICONDUCTOR MATERIALS

2019 ◽  
Vol 3 ◽  
pp. 105
Author(s):  
Samuil Khanin ◽  
Antonina Shashkina
Keyword(s):  
Fractal Dimension ◽  
Structural Heterogeneity ◽  
Semiconductor Materials ◽  
Avalanche Breakdown ◽  
Semiconductor Structures ◽  
Fractal Properties ◽  
Current Voltage ◽  
Structural Inhomogeneities ◽  
Current Voltage Characteristics ◽  
Microplasma Breakdown

This work presents experimental results on the study of current-voltage characteristics and oscillograms of microplasma pulses of the p-n-junction avalanche breakdown. Based on the latter, the pulse duration distributions are determined. As a result, it is shown that microplasma noise has fractal properties. The latter form the basis of avalanche breakdown types developed classification. The correlation between the fractal dimension of microplasma noise and structural inhomogeneities of functional semiconductor structures is revealed.

Sign in / Sign up

Export Citation Format

Share Document