Growth of high‐quality 3C‐SiC epitaxial films on off‐axis Si(001) substrates at 850 °C by reactive magnetron sputtering

Applied Physics Letters ◽

10.1063/1.112212 ◽

1994 ◽

Vol 65 (6) ◽

pp. 725-727 ◽

Author(s):

Q. Wahab ◽

M. R. Sardela ◽

L. Hultman ◽

A. Henry ◽

M. Willander ◽

...

Keyword(s):

Magnetron Sputtering ◽

Epitaxial Films ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

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Growth of high quality AlN films on CVD diamond by RF reactive magnetron sputtering

Applied Surface Science ◽

10.1016/j.apsusc.2017.09.036 ◽

2018 ◽

Vol 431 ◽

pp. 152-159 ◽

Author(s):

Liang-xian Chen ◽

Hao Liu ◽

Sheng Liu ◽

Cheng-ming Li ◽

Yi-chao Wang ◽

...

Keyword(s):

Magnetron Sputtering ◽

Cvd Diamond ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

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The effect of substrate temperature on high quality c-axis oriented AZO thin films prepared by DC reactive magnetron sputtering for photoelectric device applications

Superlattices and Microstructures ◽

10.1016/j.spmi.2013.10.003 ◽

2013 ◽

Vol 64 ◽

pp. 319-330 ◽

Author(s):

Bo He ◽

Jing Xu ◽

HuaiZhong Xing ◽

ChunRui Wang ◽

XiaoDong Zhang

Keyword(s):

Magnetron Sputtering ◽

Substrate Temperature ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

High Quality ◽

Photoelectric Device ◽

Dc Reactive Magnetron Sputtering ◽

Device Applications

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Ion Assisted Reactive Magnetron Sputtering as a Deposition Method for High Quality Thin Films of Compound Semiconductors

Solid State Phenomena ◽

10.4028/www.scientific.net/ssp.67-68.261 ◽

1999 ◽

Vol 67-68 ◽

pp. 261-268 ◽

Author(s):

K. Ellmer

Keyword(s):

Magnetron Sputtering ◽

Compound Semiconductors ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Deposition Method ◽

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Metallic sputtering growth of high quality anatase phase TiO2 films by inductively coupled plasma assisted DC reactive magnetron sputtering

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2009.06.001 ◽

2009 ◽

Vol 203 (23) ◽

pp. 3661-3668 ◽

Author(s):

Z.G. Li ◽

Y.X. Wu ◽

S. Miyake

Keyword(s):

Magnetron Sputtering ◽

Inductively Coupled Plasma ◽

Anatase Phase ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

High Quality ◽

Inductively Coupled ◽

Dc Reactive Magnetron Sputtering

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Growth and characterization of epitaxial films of tungsten-doped vanadium oxides on sapphire (110) by reactive magnetron sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581896 ◽

1999 ◽

Vol 17 (4) ◽

pp. 1817-1821 ◽

Author(s):

P. Jin ◽

M. Tazawa ◽

M. Ikeyama ◽

S. Tanemura ◽

K. Macák ◽

...

Keyword(s):

Magnetron Sputtering ◽

Vanadium Oxides ◽

Epitaxial Films ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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High-rate deposition of high-quality Sn-doped In2O3 films by reactive magnetron sputtering using alloy targets

Thin Solid Films ◽

10.1016/j.tsf.2011.06.063 ◽

2012 ◽

Vol 520 (12) ◽

pp. 4101-4105 ◽

Author(s):

Nobuto Oka ◽

Yukari Kawase ◽

Yuzo Shigesato

Keyword(s):

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

High Rate ◽

Reactive Magnetron ◽

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INFLUENCE OF DEPOSITION PARAMETERS ON THE STRUCTURE AND THERMAL STABILITY OF Ti-Al-N COATINGS PRODUCED BY REACTIVE MAGNETRON SPUTTERING

High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes) ◽

10.1615/hightempmatproc.2015015725 ◽

2015 ◽

Vol 19 (2) ◽

pp. 105-112

Author(s):

F. F. Komarov ◽

Iryna M. Klimovich ◽

O. V. Korolik ◽

V. A. Zaikov ◽

O. R. Lyudchik

Keyword(s):

Thermal Stability ◽

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Deposition Parameters ◽

Thermal Stability Of

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Microstructure and electrical property of tantalum oxynitride thin films prepared using high-power impulse reactive magnetron sputtering

Japanese Journal of Applied Physics ◽

10.35848/1347-4065/abc0ae ◽

2020 ◽

Vol 59 (11) ◽

pp. 116502

Author(s):

Ping-Yuan Lee ◽

Cheng-Xian Lin ◽

Ying-Chieh Lee

Keyword(s):

Electrical Property ◽

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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Structure and Electrical Property of CuInS2 Thin Films Deposited by DC Reactive Magnetron Sputtering

Journal of Inorganic Materials ◽

10.3724/sp.j.1077.2011.01287 ◽

2011 ◽

Vol 26 (12) ◽

pp. 1287-1292 ◽

Author(s):

Chang YAN ◽

Fang-Yang LIU ◽

Yan-Qing LAI ◽

Yi LI ◽

Jie LI ◽

...

Keyword(s):

Electrical Property ◽

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Dc Reactive Magnetron Sputtering

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Characterization of ferroelectric hafnium/zirconium oxide solid solutions deposited by reactive magnetron sputtering

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.5060643 ◽

2019 ◽

Vol 37 (2) ◽

pp. 021203 ◽

Author(s):

Jordan Bouaziz ◽

Pedro Rojo Romeo ◽

Nicolas Baboux ◽

Bertrand Vilquin

Keyword(s):

Magnetron Sputtering ◽

Solid Solutions ◽

Zirconium Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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