Chemical Bonding in Composite SiNx/Diamond-Like Carbon Films Prepared by Filter Cathodic Arc Deposition of Graphite Incorporated with Radio Frequency Sputtering of Silicon Nitride

2013 ◽  
Vol 52 (9R) ◽  
pp. 095501 ◽  
Author(s):  
Phuwanai Bunnak ◽  
Yongping Gong ◽  
Supanee Limsuwan ◽  
Artorn Pokaipisit ◽  
Pichet Limsuwan
Keyword(s):  
Silicon Nitride ◽  
Radio Frequency ◽  
Chemical Bonding ◽  
Carbon Films ◽  
Diamond Like Carbon ◽  
Radio Frequency Sputtering ◽  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Arc Deposition

Microstructure of diamond-like carbon films prepared by cathodic arc deposition

2002 ◽  
Vol 11 (7) ◽  
pp. 1436-1440 ◽  
Author(s):  
Ayako Kimura ◽  
Yasushi Azuma ◽  
Tetsuya Suzuki ◽  
Tomohiro Saito ◽  
Yuichi Ikuhara
Keyword(s):  
Carbon Films ◽  
Diamond Like Carbon ◽  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Arc Deposition

Structural Characteristics of Diamond-Like Carbon Films Synthesized by Different Methods

2017 ◽  
Vol 743 ◽  
pp. 112-117
Author(s):  
Alexander Zolkin ◽  
Anna Semerikova ◽  
Sergey Chepkasov ◽  
Maksim Khomyakov
Keyword(s):  
Amorphous Phase ◽  
Ion Beam ◽  
High Energy ◽  
Carbon Films ◽  
Ion Source ◽  
Ordered Structure ◽  
Deposition Technique ◽  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Arc Deposition

In the present study, the Raman spectra of diamond-like amorphous (a-C) and hydrogenated amorphous (a-C:H) carbon films on silicon obtained using the ion-beam methods and the pulse cathodic arc deposition technique were investigated with the aim of elucidating the relation between the hardness and structure of the films. The hardness of the samples used in the present study was 19 – 45 GPa. Hydrogenated carbon films were synthesized using END–Hall ion sources and a linear anode layer ion source (LIS) on single-crystal silicon substrates. The gas precursors were CH4 and C3H8, and the rate of the gas flow fed into the ion source was 4.4 to 10 sccm. The ion energies ranged from 150 to 600 eV. a-C films were deposited onto Si substrates using the pulse cathodic arc deposition technique. The films obtained by the pulse arc technique contained elements with an ordered structure. In the films synthesized using low- (150 eV) and high-energy (600 eV) ions beams, an amorphous phase was the major phase. The significant blurriness of the diffraction rings in the electron diffraction patterns due to a large film thickness (180 – 250 nm) did not allow distinctly observing the signals from the elements with an ordered structure against the background of an amorphous phase.

D.C. cathodic arc deposition of diamond-like carbon and effects of R.F. charge compensation

1992 ◽  
Vol 1 (8) ◽  
pp. 865-867 ◽  
Author(s):  
B. Rother ◽  
J. Siegel ◽  
K.-U. Kappich ◽  
K. Breuer
Keyword(s):  
Charge Compensation ◽  
Diamond Like Carbon ◽  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Arc Deposition

Structure of high hardness cathodic-arc deposited carbon

1995 ◽  
Vol 53 ◽  
pp. 206-207
Author(s):  
D. L. Callahan ◽  
S. D. McAdams ◽  
S. Anders ◽  
A. Anders ◽  
I.G. Brown ◽  
...  
Keyword(s):  
High Hardness ◽  
Carbon Films ◽  
Peak Hardness ◽  
Nanocrystalline Phase ◽  
Substrate Bias ◽  
Plan View ◽  
Cathodic Arc Deposition ◽  
Transmission Electron ◽  
Cathodic Arc ◽  
Arc Deposition

Carbon films exhibiting a peak hardness of 59 GPa have been produced using pulsebiased cathodic-arc deposition. This value is much greater than that expected of an amorphous "diamond-like" carbon (die) film and is well within the hardness range of chemically vapor-deposited diamond. Furthermore, this peak hardness is observed at an indentation depth of approximately 50 nm and not on the upper surface of the film. A structural analysis by transmission electron microscopy (TEM) has been conducted in order to explain these mechanical phenomena.Details of the sputtering apparatus are described elsewhere. Films for this study were deposited on silicon using a two-step process in which a thin layer, approximately 10 nm, was first deposited at a relatively high substrate bias (~2 kV) followed by growth of the majority of the film at a lower bias (~200 V). Plan-view examination of carbon films revealed both uniformly amorphous regions and extensive nanocrystalline phase regions.

scholarly journals Effect of Fluorine Incorporation on DLC Films Deposited by Pulsed Cathodic Arc Deposition on Nitrile Butadiene Rubber and Polyurethane Rubber Substrates

Coatings ◽  
2020 ◽  
Vol 10 (9) ◽  
pp. 878
Author(s):  
Lijie Zhang ◽  
Xuemei Zong ◽  
Fei Guo ◽  
Bing He ◽  
Xiaoming Yuan
Keyword(s):  
Coefficient Of Friction ◽  
Diamond Like Carbon ◽  
Butadiene Rubber ◽  
Nitrile Butadiene Rubber ◽  
Cathodic Arc Deposition ◽  
Film Coefficient ◽  
Cathodic Arc ◽  
Arc Deposition

Diamond-like carbon (DLC) and fluorinated diamond-like carbon (F-DLC) films were deposited via pulsed cathodic arc deposition on pretreated nitrile butadiene rubber (NBR) and polyurethane (PU) rubber substrates. Both DLC and F-DLC films showed a more than 50% decrease in coefficients of friction compared to uncoated NBR and PU rubber substrates. The incorporation of fluorine was found to have little influence on the film coefficient of friction. However, a decrease in film wettability was overserved in the F-DLC films compared to the DLC films.

scholarly journals Thermal stability of amorphous hard carbon films produced by cathodic arc deposition

1997 ◽  
Vol 71 (23) ◽  
pp. 3367-3369 ◽  
Author(s):  
Simone Anders ◽  
Javier Dı́az ◽  
Joel W. Ager ◽  
Roger Yu Lo ◽  
David B. Bogy
Keyword(s):  
Thermal Stability ◽  
Carbon Films ◽  
Hard Carbon ◽  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Arc Deposition ◽  
Thermal Stability Of

Cathodic arc deposition of diamond-like carbon: effect of bias voltage and deposition angle

1991 ◽  
Vol 140 ◽  
pp. 780-783 ◽  
Author(s):  
B. Rother ◽  
J. Siegel ◽  
I. Mühling ◽  
H. Fritzsch ◽  
K. Breuer
Keyword(s):  
Bias Voltage ◽  
Diamond Like Carbon ◽  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Arc Deposition ◽  
Deposition Angle

scholarly journals Mechanical Properties of Amorphous Hard Carbon Films Prepared by Cathodic ARC Deposition

1995 ◽  
Vol 383 ◽  
Author(s):  
Simone Anders ◽  
André Anders ◽  
Joel W. Ager ◽  
Zhi Wang ◽  
George M. Pharr ◽  
...  
Keyword(s):  
Bias Voltage ◽  
Deposition Process ◽  
Carbon Films ◽  
Carbon Ions ◽  
Hard Carbon ◽  
Cathodic Arc Deposition ◽  
Transmission Electron ◽  
As Stress ◽  
Cathodic Arc ◽  
Arc Deposition

ABSTRACTCathodic arc deposition combined with macroparticle filtering of the plasma is an efficient and versatile method for the deposition of amorphous hard carbon films of high quality. The film properties can be tailored over a broad range by varying the energy of the carbon ions incident upon the substrate and upon the growing film by applying a pulsed bias technique. By varying the bias voltage during the deposition process specific properties of the interface, bulk film and top surface layer can be obtained. We report on nanoindentation and transmission electron microscopy studies as well as stress measurements of cathodic-arc amorphous hard carbon films deposited with varied bias voltage. The investigations were performed on multilayers consisting of alternating hard and soft amorphous carbon.

scholarly journals Ultra-Thin Overcoats for the Head/Disk Interface Tribology

1998 ◽  
Vol 120 (4) ◽  
pp. 795-799 ◽  
Author(s):  
C. Singh Bhatia ◽  
S. Anders ◽  
I. G. Brown ◽  
K. Bobb ◽  
R. Hsiao ◽  
...  
Keyword(s):  
High Hardness ◽  
Disk Surface ◽  
Carbon Films ◽  
Head Disk Interface ◽  
Disk Interface ◽  
Cathodic Arc Deposition ◽  
Carbon Overcoats ◽  
Contact Recording ◽  
Cathodic Arc ◽  
Arc Deposition

Cathodic arc deposition forms ultra-thin amorphous hard carbon films of high sp3 content, high hardness, and low coefficient of friction. These properties make it of great interest for head/disk interface application, in particular for contact recording. In many cases, the tribological properties of the head disk interface could be improved by factors up to ten by applying cathodic arc overcoats to the slider or disk surface. This paper reviews the results of cathodic arc ultra-thin (2–10 nm) carbon overcoats for head/disk interface tribological applications.

scholarly journals Hardness, elastic modulus, and structure of very hard carbon films produced by cathodic‐arc deposition with substrate pulse biasing

1996 ◽  
Vol 68 (6) ◽  
pp. 779-781 ◽  
Author(s):  
George M. Pharr ◽  
Daniel L. Callahan ◽  
Shaun D. McAdams ◽  
Ting Y. Tsui ◽  
Simone Anders ◽  
...  
Keyword(s):  
Elastic Modulus ◽  
Carbon Films ◽  
Hard Carbon ◽  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Arc Deposition
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