Development of low-temperature and high vacuum atomic force microscope with freeze–fracture function

2001 ◽  
Vol 72 (2) ◽  
pp. 1445 ◽  
Author(s):  
Keiichi Nakamoto ◽  
C. B. Mooney ◽  
Masashi Iwatsuki
2004 ◽  
Vol 10 (S02) ◽  
pp. 1098-1099
Author(s):  
Charles B Mooney ◽  
Keiichi Nakamoto ◽  
Shin-ichi Kitamura

Extended abstract of a paper presented at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, August 1–5, 2004.


2016 ◽  
Vol 87 (7) ◽  
pp. 073702 ◽  
Author(s):  
H. von Allwörden ◽  
K. Ruschmeier ◽  
A. Köhler ◽  
T. Eelbo ◽  
A. Schwarz ◽  
...  

2012 ◽  
Vol 3 ◽  
pp. 52-56 ◽  
Author(s):  
Woo-Kyung Lee ◽  
Minchul Yang ◽  
Arnaldo R Laracuente ◽  
William P King ◽  
Lloyd J Whitman ◽  
...  

Polymer nanostructures were directly written onto substrates in ultra-high vacuum. The polymer ink was coated onto atomic force microscope (AFM) probes that could be heated to control the ink viscosity. Then, the ink-coated probes were placed into an ultra-high vacuum (UHV) AFM and used to write polymer nanostructures on surfaces, including surfaces cleaned in UHV. Controlling the writing speed of the tip enabled the control over the number of monolayers of the polymer ink deposited on the surface from a single to tens of monolayers, with higher writing speeds generating thinner polymer nanostructures. Deposition onto silicon oxide-terminated substrates led to polymer chains standing upright on the surface, whereas deposition onto vacuum reconstructed silicon yielded polymer chains aligned along the surface.


2011 ◽  
Vol 82 (2) ◽  
pp. 023705 ◽  
Author(s):  
U. Gysin ◽  
S. Rast ◽  
M. Kisiel ◽  
C. Werle ◽  
E. Meyer

2011 ◽  
Vol 110-116 ◽  
pp. 3856-3859
Author(s):  
Mohammad Reza Behforooz ◽  
Haleh Kangarloo

Using the resistive heated method, TiO2/Ag/TiO2thin files (Transparent heat windows) in vertical deposition angle were deposited on SiO2substrate, in high vacuum (HV) condition and 100°c. The thickness of TiO2on glass substrate was 50°A, Silver film 125°A and 225°A and the upper layer TiO2with 115°A. All other deposition conditions were same for both samples .Atomic force microscope (AFM), and spectrophotometric methods were used to study the nanostructures of these samples in the range of FTIR. The purpose of this work is to find and produce the structure with the least energy waste.


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