Formation and characterization of nanometer scale metal-oxide-semiconductor structures on GaAs using low-temperature atomic layer deposition

2005 ◽  
Vol 87 (1) ◽  
pp. 013501 ◽  
Author(s):  
P. D. Ye ◽  
G. D. Wilk ◽  
E. E. Tois ◽  
Jian Jim Wang
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Metal Oxide ◽  
Atomic Layer ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Nanometer Scale ◽  
Semiconductor Structures ◽  
Layer Deposition

Trap states in AlGaN/GaN metal-oxide-semiconductor structures with Al2O3 prepared by atomic layer deposition

2010 ◽  
Vol 107 (10) ◽  
pp. 106104 ◽  
Author(s):  
D. Gregušová ◽  
R. Stoklas ◽  
Ch. Mizue ◽  
Y. Hori ◽  
J. Novák ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Metal Oxide ◽  
Atomic Layer ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Trap States ◽  
Semiconductor Structures ◽  
Layer Deposition

Influence of Atomic Layer Deposition Temperature on the Electrical Properties of Al/ZrO2 /SiO2 /4H-SiC Metal-Oxide Semiconductor Structures

2018 ◽  
Vol 215 (13) ◽  
pp. 1700882 ◽  
Author(s):  
Krystian Król ◽  
Mariusz Sochacki ◽  
Andrzej Taube ◽  
Norbert Kwietniewski ◽  
Sylwia Gierałtowska ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Atomic Layer Deposition ◽  
Metal Oxide ◽  
Deposition Temperature ◽  
Atomic Layer ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Semiconductor Structures ◽  
Layer Deposition

GaAs metal-oxide-semiconductor capacitors using atomic layer deposition of HfO2 gate dielectric: Fabrication and characterization

2007 ◽  
Vol 91 (19) ◽  
pp. 193503 ◽  
Author(s):  
D. Shahrjerdi ◽  
D. I. Garcia-Gutierrez ◽  
T. Akyol ◽  
S. R. Bank ◽  
E. Tutuc ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Metal Oxide ◽  
Gate Dielectric ◽  
Atomic Layer ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Layer Deposition ◽  
Fabrication And Characterization
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