Impact of titanium addition on film characteristics of HfO2 gate dielectrics deposited by atomic layer deposition
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2005 ◽
Vol 74
(1)
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pp. 181-187
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2004 ◽
Vol 33
(8)
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pp. 912-915
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2012 ◽
Vol 51
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pp. 121101
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2017 ◽
Vol 9
(49)
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pp. 42928-42934
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