Direct observation of the epitaxial growth of molecular layers on molecular single crystals

2006 ◽  
Vol 89 (26) ◽  
pp. 261905 ◽  
Author(s):  
A. Sassella ◽  
A. Borghesi ◽  
M. Campione ◽  
S. Tavazzi ◽  
C. Goletti ◽  
...  
2017 ◽  
Vol 29 (43) ◽  
pp. 1703451 ◽  
Author(s):  
Yanqi Luo ◽  
Parisa Khoram ◽  
Sarah Brittman ◽  
Zhuoying Zhu ◽  
Barry Lai ◽  
...  

1989 ◽  
Vol 157 ◽  
Author(s):  
W. Zhou ◽  
D.X. Cao ◽  
D.K. Sood

ABSTRACTIsothermal annealing behaviour of intrinsic amorphous layers produced by stoichiometric implantation in a—axis oriented α—Al2O3 single crystals has been studied. The amorphous phase transforms directly to α—Al2O3 at a well defined planar interface which moves towards the free surface. The epitaxial growth slows down after initial rapid crystallization, indicating two separate regimes. The interface velocity shows Arrhenius behaviour in both regimes with activation energies of 0.6 and 0.08 eV respectively. There is an evidence for additional surface or random crystallization into κ or γ-Al2O3 phases within the first few nm on the surface, after prolonged annealing. These results are remarkably different from those reported previously for c–axis oriented Al2O3 crystals, showing the importance of substrate orientation during crystallization. A tentative model to explain the crystallization behaviour is discussed.


2009 ◽  
Vol 48 (11) ◽  
pp. 118003 ◽  
Author(s):  
Sawako Miyamoto ◽  
Toshihiro Shimada ◽  
Manabu Ohtomo ◽  
Akira Chikamatsu ◽  
Tetsuya Hasegawa

1996 ◽  
Vol 105 (5-6) ◽  
pp. 1105-1110 ◽  
Author(s):  
A. A. Zhukov ◽  
G. K. Perkins ◽  
J. V. Thomas ◽  
A. D. Caplin ◽  
H. K�pfer ◽  
...  

1994 ◽  
Vol 332 ◽  
Author(s):  
Bruce A. Parkinson

ABSTRACTMethods for epitaxial growth of two dimensional materials are described. The lack of interlayer bonding in these materials allows for epitaxial growth with large lattice mismatches. Growth of MoSe2 on MoS2 (a 5% mismatch) or on SnS2 (10% mismatch) can be demonstrated. Scanning tunneling microscopy (STM) revealed remarkable structures in the epilayer as a result of the large mismatches. A technique using the STM or atomic force microscope (AFM) to selectively remove single molecular layers from the surface of layered materials is also described. The combination of these two technologies may result in the ability to produce nanoscale devices exhibiting quantum size effects.


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