Thickness and grain-size dependence of the coercivity in permalloy thin films

1997 ◽  
Vol 81 (8) ◽  
pp. 4122-4124 ◽  
Author(s):  
M. A. Akhter ◽  
D. J. Mapps ◽  
Y. Q. Ma Tan ◽  
Amanda Petford-Long ◽  
R. Doole
Keyword(s):  
Thin Films ◽  
Grain Size ◽  
Size Dependence ◽  
Permalloy Thin Films

Grain size dependence on layer thickness in composition modulated thin films

1986 ◽  
Vol 4 (5-7) ◽  
pp. 313-315 ◽  
Author(s):  
A.F. Jankowski ◽  
J.F. Shewbridge
Keyword(s):  
Thin Films ◽  
Grain Size ◽  
Layer Thickness ◽  
Size Dependence

The yield stress of polycrystalline thin films

1993 ◽  
Vol 8 (2) ◽  
pp. 237-238 ◽  
Author(s):  
C.V. Thompson
Keyword(s):  
Thin Films ◽  
Grain Size ◽  
Film Thickness ◽  
Yield Stress ◽  
Size Dependence ◽  
Detailed Understanding ◽  
Polycrystalline Thin Films ◽  
Observed Behavior

In recent experiments it has been shown that the yield stress of polycrystalline thin films depends separately on the film thickness and the grain size. It was also shown that the grain size dependence varies as the reciprocal of the grain size. In this paper an analysis is presented which leads to these results and provides a more detailed understanding of the origins of the observed behavior.

Role of grain size on redox induced compositional stresses in Pr doped ceria thin films

2017 ◽  
Vol 19 (19) ◽  
pp. 12206-12220 ◽  
Author(s):  
Jay Sheth ◽  
Di Chen ◽  
Harry L. Tuller ◽  
Scott T. Misture ◽  
Sean R. Bishop ◽  
...  
Keyword(s):  
Thin Films ◽  
Grain Size ◽  
Size Dependence ◽  
Stress And Strain ◽  
Doped Ceria ◽  
X Ray Diffraction ◽  
X Ray ◽  
Compositional Stresses

In-situ wafer curvature and x-ray diffraction measurements were employed to investigate the grain size dependence of stress and strain in Pr doped ceria thin films.

Texture and Grain Size of Permalloy Thin Films Sputtered on Silicon With Cr, Ta and SiO2 Buffer Layers

1994 ◽  
Vol 343 ◽  
Author(s):  
P. Galtier ◽  
R. Jerome ◽  
T. Valet
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Transmission Electron Microscopy ◽  
Grain Size ◽  
Structural Properties ◽  
Buffer Layers ◽  
Transmission Electron ◽  
Magnetic Softness ◽  
Permalloy Thin Films

ABSTRACTWe have investigated the structural properties of Ni80Fe20 thin films sputtered on silicon with Cr, Ta and SiO2 buffer layers using transmission electron microscopy. We observe a decrease of the grain size when Ta and SiO2 underlayers are used instead of Cr. Permalloy films deposited on Ta layers are strongly (111) textured while those grown on Cr and SiO2 are mostly randomly oriented. The results are discussed with respect to the nanostructure of both Ta, Cr and SiO2 underlayers and in relation to the variation of the magnetic softness observed in this system.

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