High current stress effects in amorphous-InGaZnO4 thin-film transistors

2013 ◽  
Vol 102 (2) ◽  
pp. 023503 ◽  
Author(s):  
Mallory Mativenga ◽  
Sejin Hong ◽  
Jin Jang
2013 ◽  
Vol 34 (11) ◽  
pp. 1403-1405 ◽  
Author(s):  
Andreas Tsormpatzoglou ◽  
Nikolaos A. Hastas ◽  
Forough Mahmoudabadi ◽  
Nackbong Choi ◽  
Miltiadis K. Hatalis ◽  
...  

1997 ◽  
Vol 471 ◽  
Author(s):  
W. Eccleston

ABSTRACTThe drift of electrons in the channels of Thin Film Transistors is analysed for discrete grains separated by grain boundaries containing amorphous silicon. The model provides the relationship channel mobility and grain size. The relationship between drain current and the terminal voltages is also predicted. The model relates to normal high current region of transistor operation.


2004 ◽  
Author(s):  
Afrin Sultana ◽  
Kapil Sakariya ◽  
Arokia Nathan

2019 ◽  
Vol 28 (8) ◽  
pp. 088502
Author(s):  
Chao-Yang Han ◽  
Yuan Liu ◽  
Yu-Rong Liu ◽  
Ya-Yi Chen ◽  
Li Wang ◽  
...  

2005 ◽  
Vol 45 (2) ◽  
pp. 391-395 ◽  
Author(s):  
E. Misra ◽  
Md M. Islam ◽  
Mahbub Hasan ◽  
H.C. Kim ◽  
T.L. Alford

2013 ◽  
Vol 9 (1) ◽  
pp. 30-36 ◽  
Author(s):  
Sang Youn Han ◽  
Kyung Sook Jeon ◽  
Junho Song ◽  
Ho Sik Jeon ◽  
Byung Seong Bae

1994 ◽  
Vol 69 (2) ◽  
pp. 327-334 ◽  
Author(s):  
M. Hack ◽  
R. Weisfield ◽  
H. Steemers ◽  
M. J. Thompson ◽  
M. F. Willums ◽  
...  

AIP Advances ◽  
2015 ◽  
Vol 5 (9) ◽  
pp. 097141 ◽  
Author(s):  
Joonwoo Kim ◽  
Sung Myung ◽  
Hee-Yeon Noh ◽  
Soon Moon Jeong ◽  
Jaewook Jeong

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