Role of positive ions on the surface production of negative ions in a fusion plasma reactor type negative ion source—Insights from a three dimensional particle-in-cell Monte Carlo collisions model

2013 ◽  
Vol 20 (11) ◽  
pp. 113511 ◽  
Author(s):  
G. Fubiani ◽  
J. P. Boeuf
Keyword(s):  
Plasma Reactor ◽  
Three Dimensional ◽  
Negative Ions ◽  
Ion Source ◽  
Negative Ion ◽  
Fusion Plasma ◽  
Particle In Cell ◽  
Positive Ions ◽  
Surface Production

Plasma sheath evolution from perturbed electrodes in a negative-ion plasma. Part 2. Experiment and PIC simulation

1997 ◽  
Vol 58 (3) ◽  
pp. 455-466 ◽  
Author(s):  
SEUNGJUN YI ◽  
YASSER EL-ZEIN ◽  
KARL E. LONNGREN ◽  
TERENCE E. SHERIDAN
Keyword(s):  
Fluid Model ◽  
Negative Ions ◽  
Plasma Sheath ◽  
Negative Ion ◽  
Pic Simulation ◽  
Particle In Cell ◽  
Model Code ◽  
Positive Ions ◽  
Ion Plasma ◽  
Quasineutral Plasma

The two-dimensional spatial and temporal evolution of a plasma surrounding an electrode whose potential is suddenly decreased is experimentally investigated. The electrode contains a localized convex or a localized concave perturbation. The quasineutral plasma consists of positive ions and various proportions of negative ions and electrons. The results are compared and contrasted with those that are obtained numerically using a particle-in-cell (PIC) simulation and those that had previously been obtained using a fluid-model code.

Note on radiationless transitions involving three-body collisions

1936 ◽  
Vol 32 (3) ◽  
pp. 482-485 ◽  
Author(s):  
R. A. Smith
Keyword(s):  
Continuous Spectrum ◽  
Negative Ions ◽  
Bound State ◽  
Excess Energy ◽  
Negative Ion ◽  
Positive Ions ◽  
Continuous State ◽  
Direct Formation ◽  
Three Body ◽  
Positive Ion

When an electron makes a transition from a continuous state to a bound state, for example in the case of neutralization of a positive ion or formation of a negative ion, its excess energy must be disposed of in some way. It is usually given off as radiation. In the case of neutralization of positive ions the radiation forms the well-known continuous spectrum. No such spectrum due to the direct formation of negative ions has, however, been observed. This process has been fully discussed in a recent paper by Massey and Smith. It is shown that in this case the spectrum would be difficult to observe.

Chaos in positive ion–negative ion magnetized plasmas

2020 ◽  
Vol 86 (6) ◽  
Author(s):  
Samiran Ghosh ◽  
Biplab Maity ◽  
Swarup Poria
Keyword(s):  
Nonlinear Wave ◽  
Low Frequency ◽  
Negative Ions ◽  
Dynamical Behaviour ◽  
Negative Ion ◽  
Sound Waves ◽  
Weakly Nonlinear ◽  
Positive Ions ◽  
Experimental Parameters ◽  
Map Analysis

The dynamical behaviour of weakly nonlinear, low-frequency sound waves are investigated in a plasma composed of only positive and negative ions incorporating the effects of a weak external uniform magnetic field. In the plasma model the mass (temperature) of the positive ions is smaller (larger) than that of the negative ions. The dynamics of the nonlinear wave is shown to be governed by a novel nonlinear equation. The stationary plane wave (analytical and numerical) nonlinear analysis on the basis of experimental parameters reveals that the nonlinear wave does have quasi-periodic and chaotic solutions. The Poincarè return map analysis confirms these observed complex structures.

Negative-Ion Implantation

1994 ◽  
Vol 354 ◽  
Author(s):  
Junzo Ishikawa
Keyword(s):  
Ion Implantation ◽  
Negative Ions ◽  
Ion Source ◽  
Negative Ion ◽  
Rf Plasma ◽  
Ion Currents ◽  
Promising Technique ◽  
Surface Charging ◽  
Silicon Carbon ◽  
A Charge

AbstractNegative-ion implantation is a promising technique for forthcoming ULSI (more than 256 M bits) fabrication and TFT (for color LCD) fabrication, since the surface charging voltage of insulated electrodes or insulators implanted by negative ions is found to saturate within so few as several volts, no breakdown of insulators would be expected without a charge neutralizer in these fabrication processes. Scatter-less negative-ion implantation into powders is also possible. For this purpose an rf-plasma-sputter type heavy negative-ion source was developed, which can deliver several milliamperes of various kinds of negative ion currents such as boron, phosphor, silicon, carbon, copper, oxygen, etc. A medium current negative-ion implanter with a small version of this type of ion source has been developed.

The role of negative ions on the Jeans instability in a complex plasma in the presence of nonthermal positive ions

2006 ◽  
Vol 13 (10) ◽  
pp. 102904 ◽  
Author(s):  
Banamali Roy ◽  
Susmita Sarkar ◽  
Manoranjan Khan ◽  
M. R. Gupta
Keyword(s):  
Negative Ions ◽  
Complex Plasma ◽  
Positive Ions ◽  
Jeans Instability

Modeling a high power fusion plasma reactor-type ion source: Applicability of particle methods

2012 ◽  
Vol 19 (4) ◽  
pp. 043506 ◽  
Author(s):  
G. Fubiani ◽  
G. J. M. Hagelaar ◽  
J. P. Boeuf ◽  
S. Kolev
Keyword(s):  
High Power ◽  
Plasma Reactor ◽  
Ion Source ◽  
Particle Methods ◽  
Fusion Plasma ◽  
Reactor Type

scholarly journals Effect of DC Biased Voltage and Ion Temperature on Bounded Ion-Ion Plasma

2020 ◽  
Vol 25 (1) ◽  
pp. 61-67
Author(s):  
Anish Maskey ◽  
Atit Deuja ◽  
Suresh Basnet ◽  
Raju Khanal
Keyword(s):  
Electric Field ◽  
Strong Electric Field ◽  
Negative Ions ◽  
Simulation Method ◽  
Negative Ion ◽  
Ion Temperature ◽  
Plasma Parameters ◽  
Degree Of Ionization ◽  
Particle In Cell ◽  
Ion Plasma

 A one dimensional particle-in-cell (PIC) simulation method has been employed to study the effect of DC voltage and ion temperature on the properties of ion-ion plasma bounded by two symmetrical but oppositely biased electrodes. It is assumed that the ion-ion plasma is collisionless and both the positive and negative ion species have the same mass, temperature, and degree of ionization. Simulation results show that the formation of sheath and presheath regions and fluctuation of plasma parameters in that region are affected by the biasing voltage and ion temperature. It was found that the magnitude of the electrostatic electric field at the vicinity of biasing electrodes was affected by the biasing voltage and ion temperature as well. This strong electric field close to the electrodes further prevents the flow of charged particles towards the electrodes. The presence of a non-zero electric field at the quasineutral region suggests a presheath region similar to the electron-ion plasma. In the quasineutral region, the density of ions increased with the increase in biasing voltage and decreased with the increase in temperature of isothermal ions. Furthermore, the phase space diagrams for the ions were obtained which indicated different regions of the plasma. The positive ions acquire negative velocity towards the negatively biased electrode and the negative ions acquire positive velocity towards the positively biased electrode.

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