Single-mode SiON/SiO2/Si optical waveguides prepared by plasma-enhanced chemical vapor deposition

1995 ◽  
Vol 14 (2) ◽  
pp. 133-139
Author(s):  
Yuan-Kuang Tu ◽  
Jung-Chuan Chou ◽  
Shiang-Ping Cheng
1995 ◽  
Vol 397 ◽  
Author(s):  
J.C. Roberts ◽  
K.S. Boutros ◽  
S.M. Bedair

ABSTRACTDirect writing of GaAs optical waveguides has been achieved by laser assisted chemical vapor deposition (LCVD). The multimode waveguides have gaussian-like cross sections, smooth surfaces, and exhibit losses as low as 5.4 dB/cm. The LCVD technique offers the capability of maskless in situ selective epitaxial growth of diverse multilayer structures, and is therefore a novel alternative for the monolithic integration of optoelectronic integrated circuits.


1996 ◽  
Vol 68 (15) ◽  
pp. 2041-2042 ◽  
Author(s):  
K. S. Boutros ◽  
J. C. Roberts ◽  
S. M. Bedair

2014 ◽  
Vol 307 ◽  
pp. 327-332 ◽  
Author(s):  
C. Zhang ◽  
B.Y. Man ◽  
S.Z. Jiang ◽  
C. Yang ◽  
M. Liu ◽  
...  

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