Characterization of a compact ECR plasma source and its applications to studies of helium ion damage to tungsten

NiCr/NiSi functional thin films of temperature measurement of cutter sensor were prepared by means of advanced Twinned microwave ECR plasma source enhanced Radio Frequency (RF) reaction non-balance magnetron sputtering technique. Fabrication technologies of NiCr/NiSi thin films were studied. The Compositions, micro-morphology, general structure and depth of NiCr/NiSi thin films were analyzed by means of Electron Probe, SEM, AFM, step profiler and stereo vision micro operation system. The results showed that NiCr/NiSi thin-films were small depth, uniform compact, smooth and good continuity, composition of which was close to target.

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Merits of microwave plasmas for optical emission spectrometry – characterization of an axially viewed microwave-sustained, inductively coupled, atmospheric-pressure plasma (MICAP)

Journal of Analytical Atomic Spectrometry ◽

10.1039/d0ja00293c ◽

2020 ◽

Vol 35 (10) ◽

pp. 2369-2377

Author(s):

Helmar Wiltsche ◽

Matthias Wolfgang

Keyword(s):

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Optical Emission ◽

Plasma Source ◽

Optical Emission Spectrometry ◽

Emission Spectrometry ◽

Icp Oes ◽

Microwave Plasmas ◽

Inductively Coupled

The MICAP is a microwave driven plasma source employing nitrogen as the plasma gas. In this work we compare LODs and LOQs obtained in axial viewing with those obtained by ICP-OES and evaluate the effect of air instead of nitrogen as the plasma gas.

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Description and characterization of a ECR plasma device developed for thin film deposition

Brazilian Journal of Physics ◽

10.1590/s0103-97332003000100011 ◽

2003 ◽

Vol 33 (1) ◽

pp. 123-127 ◽

Cited By ~ 5

Author(s):

J.A.S. da Matta ◽

R.M.O. Galvão ◽

L. Ruchko ◽

M.C.A. Fantini ◽

P.K. Kiyohara

Keyword(s):

Thin Film ◽

Thin Film Deposition ◽

Film Deposition ◽

Ecr Plasma ◽

Plasma Device

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Characterization of the defects in oxide dispersion-strengthened iron alloy after helium ion irradiation

2015 IEEE 26th Symposium on Fusion Engineering (SOFE) ◽

10.1109/sofe.2015.7482326 ◽

2015 ◽

Author(s):

P. L. Gao ◽

X. Ju ◽

Y. Xin ◽

Q. S. Cao ◽

P. L. Gao ◽

...

Keyword(s):

Ion Irradiation ◽

Iron Alloy ◽

Oxide Dispersion Strengthened ◽

Oxide Dispersion ◽

Helium Ion

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Morphology and Crystallographic Characterization of Nickel Nanowires—Influence of Magnetic Field and Current Density During Synthesis

Journal of Nanotechnology in Engineering and Medicine ◽

10.1115/1.4028026 ◽

2014 ◽

Vol 5 (2) ◽

Cited By ~ 7

Author(s):

Mahendran Samykano ◽

Ram Mohan ◽

Shyam Aravamudhan

Keyword(s):

Magnetic Field ◽

Current Density ◽

Quality Data ◽

Synthesis Process ◽

X Ray Diffraction ◽

X Ray ◽

Nickel Nanowires ◽

Helium Ion ◽

Sem Imaging

This paper presents results and discussion from a comprehensive morphological and crystallographic characterization of nickel nanowires synthesized by template-based electrodeposition method. In particular, the influence of magnetic and electric field (current density) conditions during the synthesis of nickel nanowires was studied. The structure and morphology of the synthesized nanowires were studied using Helium ion microscopy (HIM) and scanning electron microscopy (SEM) methods. The HIM provided higher quality data and resolution compared to conventional SEM imaging. The crystallographic properties of the grown nanowires were also studied using X-ray diffraction (XRD). The results clearly indicated that the morphological and crystallographic properties of synthesized nickel nanowires were strongly influenced by the applied magnetic field and current density intensity during the synthesis process.

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