scholarly journals Characterization of Ion Acceleration Processes in a Surface ECR Plasma Source

2008 ◽  
Author(s):  
Bradley Sommers ◽  
John Foster
Keyword(s):  
Plasma Source ◽  
Ion Acceleration ◽  
Ecr Plasma

Characterization of CNx films prepared by twinned ECR plasma source enhanced DC magnetron sputtering

2001 ◽  
Vol 390 (1-2) ◽  
pp. 107-112 ◽  
Author(s):  
Jun Xu ◽  
Xinlu Deng ◽  
Jialiang Zhang ◽  
Wenqi Lu ◽  
Tengcai Ma
Keyword(s):  
Magnetron Sputtering ◽  
Plasma Source ◽  
Dc Magnetron Sputtering ◽  
Ecr Plasma ◽  
Cnx Films

Characterization of atomic oxygen from an ECR plasma source

2002 ◽  
Vol 11 (4) ◽  
pp. 361-367 ◽  
Author(s):  
M Naddaf ◽  
V N Bhoraskar ◽  
A B Mandale ◽  
S R Sainkar ◽  
S V Bhoraskar
Keyword(s):  
Atomic Oxygen ◽  
Plasma Source ◽  
Ecr Plasma

Characterization of a compact ECR plasma source and its applications to studies of helium ion damage to tungsten

2016 ◽  
Vol T167 ◽  
pp. 014040 ◽  
Author(s):  
D Donovan ◽  
D Buchenauer ◽  
J Whaley ◽  
R Friddle
Keyword(s):  
Plasma Source ◽  
Ecr Plasma ◽  
Helium Ion ◽  
Ion Damage

Fabrication and Characterization of NiCr/NiSi Functional Thin Films on Temperature Measurement of Cutter Sensor

2010 ◽  
Vol 431-432 ◽  
pp. 535-538 ◽  
Author(s):  
Yun Xian Cui ◽  
De Shun Yang ◽  
Qi Yong Zeng ◽  
Bao Yuan Sun
Keyword(s):  
Thin Films ◽  
Temperature Measurement ◽  
General Structure ◽  
Plasma Source ◽  
Operation System ◽  
Ecr Plasma ◽  
Small Depth ◽  
Fabrication And Characterization ◽  
Micro Morphology

NiCr/NiSi functional thin films of temperature measurement of cutter sensor were prepared by means of advanced Twinned microwave ECR plasma source enhanced Radio Frequency (RF) reaction non-balance magnetron sputtering technique. Fabrication technologies of NiCr/NiSi thin films were studied. The Compositions, micro-morphology, general structure and depth of NiCr/NiSi thin films were analyzed by means of Electron Probe, SEM, AFM, step profiler and stereo vision micro operation system. The results showed that NiCr/NiSi thin-films were small depth, uniform compact, smooth and good continuity, composition of which was close to target.

scholarly journals Merits of microwave plasmas for optical emission spectrometry – characterization of an axially viewed microwave-sustained, inductively coupled, atmospheric-pressure plasma (MICAP)

2020 ◽  
Vol 35 (10) ◽  
pp. 2369-2377
Author(s):  
Helmar Wiltsche ◽  
Matthias Wolfgang
Keyword(s):  
Atmospheric Pressure ◽  
Atmospheric Pressure Plasma ◽  
Optical Emission ◽  
Plasma Source ◽  
Optical Emission Spectrometry ◽  
Emission Spectrometry ◽  
Icp Oes ◽  
Microwave Plasmas ◽  
Inductively Coupled

The MICAP is a microwave driven plasma source employing nitrogen as the plasma gas. In this work we compare LODs and LOQs obtained in axial viewing with those obtained by ICP-OES and evaluate the effect of air instead of nitrogen as the plasma gas.

scholarly journals Description and characterization of a ECR plasma device developed for thin film deposition

2003 ◽  
Vol 33 (1) ◽  
pp. 123-127 ◽  
Author(s):  
J.A.S. da Matta ◽  
R.M.O. Galvão ◽  
L. Ruchko ◽  
M.C.A. Fantini ◽  
P.K. Kiyohara
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Ecr Plasma ◽  
Plasma Device

scholarly journals Characterization of hydrogen plasma in a permanent ring magnet based helicon plasma source for negative ion source research

2019 ◽  
Vol 61 (6) ◽  
pp. 065003 ◽  
Author(s):  
A Pandey ◽  
Debrup Mukherjee ◽  
Dipshikha Borah ◽  
M Bandyopadhyay ◽  
Himanshu Tyagi ◽  
...  
Keyword(s):  
Hydrogen Plasma ◽  
Plasma Source ◽  
Ion Source ◽  
Negative Ion ◽  
Helicon Plasma ◽  
Ring Magnet
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