Atomic layer-deposited platinum in high-k/metal gate stacks

2009 ◽  
Vol 24 (12) ◽  
pp. 125013 ◽  
Author(s):  
Christoph Henkel ◽  
Stephan Abermann ◽  
Ole Bethge ◽  
Emmerich Bertagnolli
Keyword(s):  
Atomic Layer ◽  
Gate Stacks ◽  
Metal Gate ◽  
High K

Atomic Layer Deposition of Zirconium-Based High-k Metal Gate Oxide: Effect of Si Containing Zr Precursor

2015 ◽  
Vol 15 (1) ◽  
pp. 382-385
Author(s):  
Jun Hee Cho ◽  
Sang-Ick Lee ◽  
Jong Hyun Kim ◽  
Sang Jun Yim ◽  
Hyung Soo Shin ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Gate Oxide ◽  
Metal Gate ◽  
Layer Deposition ◽  
High K

Enhanced degradation of n-MOSFETs with high-k/metal gate stacks under channel hot-carrier/gate-induced drain leakage alternating stress

2012 ◽  
Vol 52 (9-10) ◽  
pp. 1901-1904 ◽  
Author(s):  
Dongwoo Kim ◽  
Seonhaeng Lee ◽  
Cheolgyu Kim ◽  
Chiho Lee ◽  
Jeongsoo Park ◽  
...  
Keyword(s):  
Gate Stacks ◽  
Metal Gate ◽  
Hot Carrier ◽  
High K ◽  
Enhanced Degradation

Bottom-up method for work function tuning in high-k/metal gate stacks in advanced CMOS technologies

2011 ◽  
Author(s):  
Mrunal A. Khaderbad ◽  
Rohit Pandharipande ◽  
Aradhana Gautam ◽  
Abhishek Mishra ◽  
Meenakshi Bhaisare ◽  
...  
Keyword(s):  
Work Function ◽  
Gate Stacks ◽  
Metal Gate ◽  
Bottom Up ◽  
High K ◽  
Work Function Tuning

Interplay between Dry Etch and Wet Clean in Patterning La2O3/HfO2 Containing High-k/metal Gate Stacks

2019 ◽  
Vol 25 (5) ◽  
pp. 29-36
Author(s):  
Ingrid Vos ◽  
David Hellin ◽  
Christa Vrancken ◽  
Jef Geypen ◽  
Hugo Bender ◽  
...  
Keyword(s):  
Gate Stacks ◽  
Metal Gate ◽  
High K ◽  
Dry Etch
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