Combined effect of the target composition and deposition temperature on the properties of ZnO:Ga transparent conductive oxide films in pulsed dc magnetron sputtering

2011 ◽  
Vol 26 (11) ◽  
pp. 115007 ◽  
Author(s):  
Sanghun Lee ◽  
Dongkeun Cheon ◽  
Won-Jeong Kim ◽  
Kyung-Jun Ahn ◽  
Woong Lee
Keyword(s):  
Magnetron Sputtering ◽  
Deposition Temperature ◽  
Oxide Films ◽  
Transparent Conductive Oxide ◽  
Combined Effect ◽  
Dc Magnetron Sputtering ◽  
Target Composition ◽  
Pulsed Dc ◽  
Conductive Oxide ◽  
Pulsed Dc Magnetron Sputtering

Deposition temperature effects on the characteristics of a-Si:H deposited by pulsed DC magnetron sputtering

2009 ◽  
Vol 206 (7) ◽  
pp. 1504-1509 ◽  
Author(s):  
R. Cherfi ◽  
A. Abdelmoumene ◽  
M. Kechouane ◽  
A. Rahal ◽  
M. Aoucher ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Temperature Effects ◽  
Deposition Temperature ◽  
Dc Magnetron Sputtering ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering

Comparative study on early stages of film growth for transparent conductive oxide films deposited by dc magnetron sputtering

2008 ◽  
Vol 516 (14) ◽  
pp. 4598-4602 ◽  
Author(s):  
Yasushi Sato ◽  
Mikihiro Taketomo ◽  
Norihiro Ito ◽  
Amica Miyamura ◽  
Yuzo Shigesato
Keyword(s):  
Magnetron Sputtering ◽  
Comparative Study ◽  
Film Growth ◽  
Oxide Films ◽  
Transparent Conductive Oxide ◽  
Dc Magnetron Sputtering ◽  
Early Stages ◽  
Conductive Oxide

Characterization of Ti–Zr–V thin films deposited by DC and unipolar pulsed DC magnetron sputtering

Vacuum ◽  
2021 ◽  
Vol 188 ◽  
pp. 110200
Author(s):  
Sihui Wang ◽  
Wei Wei ◽  
Yonghao Gao ◽  
Haibin Pan ◽  
Yong Wang
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering
Sign in / Sign up

Export Citation Format

Share Document