The influence of pre-heating temperature on the CIGS thin film growth and device performance prepared in cracked-Se atmosphere

2015 ◽  
Vol 30 (10) ◽  
pp. 105012 ◽  
Author(s):  
Guangmin Li ◽  
Wei Liu ◽  
Yiming Liu ◽  
Shuping Lin ◽  
Xiaodong Li ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Heating Temperature ◽  
Thin Film Growth ◽  
Device Performance ◽  
Cigs Thin Film

A comparative study of solution based CIGS thin film growth on different glass substrates

2011 ◽  
Vol 258 (1) ◽  
pp. 120-125 ◽  
Author(s):  
Se Jin Park ◽  
Eunjoo Lee ◽  
Hyo Sang Jeon ◽  
Se Jin Ahn ◽  
Min-Kyu Oh ◽  
...  
Keyword(s):  
Thin Film ◽  
Comparative Study ◽  
Film Growth ◽  
Thin Film Growth ◽  
Glass Substrates ◽  
Cigs Thin Film

scholarly journals Thin film growth of heavy fermion chiral magnet YbNi3Al9

2021 ◽  
Vol 118 (10) ◽  
pp. 102402
Author(s):  
Hiroaki Shishido ◽  
Akira Okumura ◽  
Tatsuya Saimyoji ◽  
Shota Nakamura ◽  
Shigeo Ohara ◽  
...  
Keyword(s):  
Thin Film ◽  
Heavy Fermion ◽  
Film Growth ◽  
Thin Film Growth

Radical-triggered cross-linking for molecular layer deposition of SiAlCOH hybrid thin films

2021 ◽  
Author(s):  
Kristina Ashurbekova ◽  
Karina Ashurbekova ◽  
Iva Saric ◽  
Evgeny Modin ◽  
Mladen Petravic ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Molecular Layer ◽  
Thin Film Growth ◽  
Cross Linking ◽  
Layer By Layer ◽  
Molecular Layer Deposition ◽  
Layer Deposition ◽  
Hybrid Thin Films ◽  
Enhanced Stability

We developed a thin film growth with a radical-initiated cross-linking of vinyl groups in a layer-by-layer manner via molecular layer deposition (MLD). The cross-linked film exhibited improved properties like 12% higher density and enhanced stability compared to the non-cross-linked film.

Atomic Layer Deposition of Chalcogenides for Next-Generation Phase Change Memory

2021 ◽  
Author(s):  
Yoon Kyeung Lee ◽  
Chanyoung Yoo ◽  
Woohyun Kim ◽  
Jeongwoo Jeon ◽  
Cheol Seong Hwang
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Film Growth ◽  
Phase Change Memory ◽  
Film Surface ◽  
Atomic Layer ◽  
Thin Film Growth ◽  
Growth Technique ◽  
Layer Deposition ◽  
Change Memory

Atomic layer deposition (ALD) is a thin film growth technique that uses self-limiting, sequential reactions localized at the growing film surface. It guarantees exceptional conformality on high-aspect-ratio structures and controllability...

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