Epitaxial growth and room-temperature ferromagnetism of quasi-2D layered Cr4Te5thin ﬁlm

Abstract Large-scale growth of two-dimensional (2D) ferromagnetic thin ﬁlms will provide an ideal platform for studying 2D magnetism and active spintronic devices. However, controllable growth of 2D ferromagnets over large areas faces tremendous challenges. Herein, we report a large-area growth of 2D ferromagnetic single-crystal thin ﬁlms Cr4Te5 on Al2O3 (0001) substrates using pulsed laser deposition. X-ray diﬀraction patterns and atomic force microscopy detection conﬁrm that all thin ﬁlms are high quality epitaxy together with atom-level smooth. Magnetic measurements show the persistence of ferromagnetic ordering state up to above room temperature, with a Curie temperature 320 K, atomic magnetic moment 0.307µB/Cr, and the easy-magnetization axis in ﬁlm plane. Comparing bulk Cr4Te5 single-crystal, the critical exponent β=0.491 indicates that the magnetic interactions of thin ﬁlm obey mean-ﬁeld model rather than 3D Heisenberg model. This work will open a avenue for growing large-scale 2D ferromagnet and developing room temperature 2D magnet-based nanodevices.

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Room-temperature ferromagnetism in single crystal Fe1.7Ge thin films of high thermal stability grown on Ge(111)

Applied Physics Letters ◽

10.1063/1.2961007 ◽

2008 ◽

Vol 93 (3) ◽

pp. 033114 ◽

Cited By ~ 17

Author(s):

R. Jaafar ◽

Y. Nehme ◽

D. Berling ◽

J. L. Bubendorff ◽

A. Mehdaoui ◽

...

Keyword(s):

Thin Films ◽

Thermal Stability ◽

Single Crystal ◽

Room Temperature ◽

Room Temperature Ferromagnetism ◽

High Thermal Stability

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Oxygen vacancy mediated room temperature ferromagnetism in Cu-doped LiNbO3 thin films

Journal of Magnetism and Magnetic Materials ◽

10.1016/j.jmmm.2021.167775 ◽

2021 ◽

Vol 527 ◽

pp. 167775

Author(s):

Xiaodong Zhou ◽

Erlei Wang ◽

Xiaodong Lao ◽

Yongmei Wang ◽

Honglei Yuan

Keyword(s):

Thin Films ◽

Oxygen Vacancy ◽

Room Temperature ◽

Room Temperature Ferromagnetism

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Room-temperature ferromagnetism in (Ga, Mn)N thin films grown by pulsed laser deposition

Superlattices and Microstructures ◽

10.1016/j.spmi.2004.09.004 ◽

2004 ◽

Vol 36 (4-6) ◽

pp. 403-408 ◽

Cited By ~ 9

Author(s):

D. O’Mahony ◽

F. McGee ◽

M. Venkatesan ◽

J.G. Lunney ◽

J.M.D. Coey

Keyword(s):

Thin Films ◽

Pulsed Laser Deposition ◽

Room Temperature ◽

Room Temperature Ferromagnetism ◽

Pulsed Laser ◽

Laser Deposition

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AFM Study of Surface Morphology of Aluminum Nitride Thin Films

MRS Proceedings ◽

10.1557/proc-388-399 ◽

1995 ◽

Vol 388 ◽

Cited By ~ 4

Author(s):

Yoshihisa Watanabe ◽

Yoshikazu Nakamura ◽

Shigekazu Hirayama ◽

Yuusaku Naota

Keyword(s):

Thin Films ◽

Surface Morphology ◽

Substrate Temperature ◽

Single Crystal ◽

Room Temperature ◽

Ion Beam ◽

Soda Lime ◽

Silicon Single Crystal ◽

Soda Lime Glass ◽

Average Roughness

AbstractAluminum nitride (AlN) thin films have been synthesized by ion-beam assisted deposition method. Film deposition has been performed on the substrates of silicon single crystal, soda-lime glass and alumin A. the influence of the substrate roughness on the film roughness is studied. the substrate temperature has been kept at room temperature and 473K and the kinetic energy of the incident nitrogen ion beam and the deposition rate have been fixed to 0.5 keV and 0.07 nm/s, respectively. the microstructure of the synthesized films has been examined by X-ray diffraction (XRD) and the surface morphology has been observed by atomic force microscopy(AFM). IN the XRD patterns of films synthesized at both room temperature and 473K, the diffraction line indicating the alN (10*0) can be discerned and the broad peak composed of two lines indicating the a1N (00*2) and a1N (10*1) planes is also observed. aFM observations for 100 nm films reveal that (1) the surface of the films synthesized on the silicon single crystal and soda-lime glass substrates is uniform and smooth on the nanometer scale, (2) the average roughness of the films synthesized on the alumina substrate is similar to that of the substrate, suggesting the evaluation of the average roughness of the film itself is difficult in the case of the rough substrate, and (3) the average roughness increases with increasing the substrate temperature.

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