scholarly journals Carbon impurities behavior and its impact on ion thermal confinement in high-ion-temperature deuterium discharges on the Large Helical Device

2018 ◽  
Vol 60 (7) ◽  
pp. 074005 ◽  
Author(s):  
K Mukai ◽  
K Nagaoka ◽  
H Takahashi ◽  
M Yokoyama ◽  
S Murakami ◽  
...  
2014 ◽  
Vol 56 (9) ◽  
pp. 095011 ◽  
Author(s):  
M Osakabe ◽  
H Takahashi ◽  
K Nagaoka ◽  
S Murakami ◽  
I Yamada ◽  
...  

2020 ◽  
Author(s):  
Polla Rouf ◽  
Pitsiri Sukkaew ◽  
Lars Ojamäe ◽  
Henrik Pedersen

<p>Aluminium nitride (AlN) is a semiconductor with a wide range of applications from light emitting diodes to high frequency transistors. Electronic grade AlN is routinely deposited at 1000 °C by chemical vapour deposition (CVD) using trimethylaluminium (TMA) and NH<sub>3</sub> while low temperature CVD routes to high quality AlN are scarce and suffer from high levels of carbon impurities in the film. We report on an ALD-like CVD approach with time-resolved precursor supply where thermally induced desorption of methyl groups from the AlN surface is enhanced by the addition of an extra pulse, H<sub>2</sub>, N<sub>2</sub> or Ar between the TMA and NH<sub>3</sub> pulses. The enhanced desorption allowed deposition of AlN films with carbon content of 1 at. % at 480 °C. Kinetic- and quantum chemical modelling suggest that the extra pulse between TMA and NH<sub>3</sub> prevents re-adsorption of desorbing methyl groups terminating the AlN surface after the TMA pulse. </p>


2021 ◽  
Vol 127 (2) ◽  
Author(s):  
X. D. Du ◽  
R. J. Hong ◽  
W. W. Heidbrink ◽  
X. Jian ◽  
H. Wang ◽  
...  
Keyword(s):  

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Lilla Fijołek ◽  
Joanna Świetlik ◽  
Marcin Frankowski

AbstractIn water treatment technology, activated carbons are used primarily as sorbents to remove organic impurities, mainly natural organic matter, but also as catalysts in the ozonation process. Commercially available activated carbons are usually contaminated with mineral substances, classified into two main groups: alkali metals (Ca, Na, K, Li, Mg) and multivalent metals (Al, Fe, Ti, Si). The presence of impurities on the carbon surface significantly affects the pHpzc values determined for raw and ozonated carbon as well as their acidity and alkalinity. The scale of the observed changes strongly depends on the pH of the ozonated system, which is related to the diffusion of impurities from the carbon to the solution. In an acidic environment (pH 2.5 in this work), the ozone molecule is relatively stable, yet active carbon causes its decomposition. This is the first report that indirectly indicates that contaminants on the surface of activated carbon (multivalent elements) contribute to the breakdown of ozone towards radicals, while the process of ozone decomposition by purified carbons does not follow the radical path in bulk solution. Carbon impurities also change the distribution of the reaction products formed by organic pollutants ozonation, which additionally confirms the radical process. The study showed that the use of unpurified activated carbon in the ozonation of succinic acid (SA) leads to the formation of a relatively large amount of oxalic acid (OA), which is a product of radical SA degradation. On the other hand, in solutions with purified carbon, the amount of OA generated is negligible.


Materials ◽  
2021 ◽  
Vol 14 (7) ◽  
pp. 1620
Author(s):  
Robert Köhler ◽  
Domenico Hellrung ◽  
Daniel Tasche ◽  
Christoph Gerhard

The chemical composition of ground and polished fused silica glass surfaces plays a decisive role in different applications of optics. In particular, a high level of carbon impurities is often undesirable for further processing and especially for gluing or cementing where adhesion failure may be attributed to carbonic surface-adherent contaminants. In this study, the surface carbon content at different stages of classical optics manufacturing was thus investigated. Two different standard processes—grinding and lapping with two final polishing processes using both polyurethane and pitch pads—were considered. After each process step, the chemical composition and roughness of the surface were analysed using X-ray photoelectron spectroscopy and atomic force microscopy. An obvious correlation between surface roughness and effective surface area, respectively, and the proportion of carbon contamination was observed. The lowest carbon contamination was found in case of lapped and pitch polished surfaces.


2012 ◽  
Vol 19 (10) ◽  
pp. 102508 ◽  
Author(s):  
J. Chowdhury ◽  
S. Brunner ◽  
R. Ganesh ◽  
X. Lapillonne ◽  
L. Villard ◽  
...  

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