Low-temperature plasma enhanced atomic layer deposition of large area HfS2 nanocrystal thin films

2020 ◽  
Vol 29 (3) ◽  
pp. 038102 ◽  
Author(s):  
Ailing Chang ◽  
Yichen Mao ◽  
Zhiwei Huang ◽  
Haiyang Hong ◽  
Jianfang Xu ◽  
...  
2019 ◽  
Vol 25 (4) ◽  
pp. 233-242 ◽  
Author(s):  
Stephen E. Potts ◽  
Luc R. Van den Elzen ◽  
Gijs Dingemans ◽  
Erik Langereis ◽  
Wytze Keuning ◽  
...  

Nanoscale ◽  
2018 ◽  
Vol 10 (18) ◽  
pp. 8615-8627 ◽  
Author(s):  
Akhil Sharma ◽  
Marcel A. Verheijen ◽  
Longfei Wu ◽  
Saurabh Karwal ◽  
Vincent Vandalon ◽  
...  

A low-temperature plasma enhanced atomic layer deposition process is demonstrated to synthesize high quality 2-D MoS2 films with tuneable morphology.


2014 ◽  
Vol 2 (12) ◽  
pp. 2123-2136 ◽  
Author(s):  
Cagla Ozgit-Akgun ◽  
Eda Goldenberg ◽  
Ali Kemal Okyay ◽  
Necmi Biyikli

The authors report on the use of hollow cathode plasma for low-temperature plasma-assisted atomic layer deposition (PA-ALD) of crystalline AlN, GaN and AlxGa1−xN thin films with low impurity concentrations.


2010 ◽  
Vol 157 (7) ◽  
pp. P66 ◽  
Author(s):  
S. E. Potts ◽  
W. Keuning ◽  
E. Langereis ◽  
G. Dingemans ◽  
M. C. M. van de Sanden ◽  
...  

2021 ◽  
Vol 47 (1) ◽  
pp. 96-98
Author(s):  
A. S. Gudovskikh ◽  
D. A. Kudryashov ◽  
A. I. Baranov ◽  
A. V. Uvarov ◽  
I. A. Morozov

2018 ◽  
Vol 6 (24) ◽  
pp. 6471-6482 ◽  
Author(s):  
Ali Haider ◽  
Petro Deminskyi ◽  
Mehmet Yilmaz ◽  
Kholoud Elmabruk ◽  
Ibrahim Yilmaz ◽  
...  

In this work, we demonstrate vertical GaN, AlN, and InN hollow nano-cylindrical arrays (HNCs) grown on Si substrates using anodized aluminum oxide (AAO) membrane templated low-temperature plasma-assisted atomic layer deposition (PA-ALD).


2019 ◽  
Vol 14 (1) ◽  
Author(s):  
Zhen Zhu ◽  
Perttu Sippola ◽  
Oili M. E. Ylivaara ◽  
Chiara Modanese ◽  
Marisa Di Sabatino ◽  
...  

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