scholarly journals Influence of deposition parameters on Tribological Performance of HVOF Coating: A review

2021 ◽  
Vol 1017 (1) ◽  
pp. 012015
Author(s):  
Alok Vats ◽  
Arun Kumar ◽  
Amar Patnaik ◽  
M L Meena
Keyword(s):  
Tribological Performance ◽  
Hvof Coating ◽  
Deposition Parameters

Influence of deposition parameters on the residual stresses of WC-Wo sputtered thin films

MRS Advances ◽  
2020 ◽  
Vol 5 (23-24) ◽  
pp. 1215-1223
Author(s):  
R.R. Phiri ◽  
O.P. Oladijo ◽  
E.T. Akinlabi
Keyword(s):  
Thin Films ◽  
Residual Stress ◽  
Residual Stresses ◽  
Substrate Surface ◽  
Tribological Performance ◽  
X Ray Diffraction ◽  
X Ray ◽  
Compressive Stresses ◽  
Deposition Parameters ◽  
Cobalt Thin Films

AbstractControl and manipulation of residual stresses in thin films is a key for attaining coatings with high mechanical and tribological performance. It is therefore imperative to have reliable residual stress measurements methods to further understand the dynamics involved. The sin2ψ method of X-ray diffraction was used to investigate the residual stresses on the tungsten carbide cobalt thin films deposited on a mild steel surface to understand the how the deposition parameters influence the generation of residual stresses within the substrate surface. X-ray spectra of the surface revealed an amorphous phase of the thin film therefore the stress measured was of the substrate surface and the effects of sputtering parameters on residual stress were analysed. Compressive stresses were identified within all samples studied. The results reveal that as the sputtering parameters are varied, the residual stresses also change. Optimum deposition parameters in terms of residual stresses were suggested.

Minimization of Through Thickness Flaws in Tungsten-Doped Diamond Like Carbon Thin Film

2006 ◽  
Author(s):  
Jeries Abou-Hanna ◽  
Jose´ Lozano ◽  
Wael Abuzaid ◽  
Raghu Gaikwad ◽  
John Carlson
Keyword(s):  
Film Surface ◽  
Deposition Process ◽  
Tribological Performance ◽  
The Other ◽  
Diamond Like Carbon ◽  
Substrate Roughness ◽  
Dlc Coatings ◽  
Deposition Parameters ◽  
Surface Contaminants ◽  
Significant Size

Tungsten-doped diamond-like carbon (DLC) coatings have been magnetron sputtered onto 52100 steel with chromium and chromium/tungsten carbide dual interlayers. The surface finish (Ra) of the substrate before deposition was 0.102 to 0.203 μm for a set of blocks and 0.05 to 0.10 μm for another set of samples, called buttons. SEM and TEM analyses revealed that this substrate finish as well as surface contaminants resulted in the formation of significant size flaws that develop during the deposition process through the film thickness. On the other hand a perfect flawless film was seen with the smooth substrate in the coupons. It was also observed that the film amplifies the substrate roughness. These two findings impact the tribological performance of the film. Current efforts attempted to determine an optimum set of deposition parameters, such as temperature and buffering gas pressure that would minimize or eliminate the formation of such flaws, and consequently minimize the roughness of the film surface.

Hetero-Epitaxy of Group Va Metals on Sapphire

1972 ◽  
Vol 30 ◽  
pp. 492-493
Author(s):  
J. E. O'Neal ◽  
J. J. Bellina ◽  
B. B. Rath
Keyword(s):  
Thermal Contact ◽  
High Vacuum ◽  
Electron Beam Evaporation ◽  
Ultra High Vacuum ◽  
Backing Plate ◽  
Sapphire Substrates ◽  
Deposition Parameters ◽  
Polishing Damage ◽  
Reflection Electron Diffraction

Thin films of the bcc metals vanadium, niobium and tantalum were epitaxially grown on (0001) and sapphire substrates. Prior to deposition, the mechanical polishing damage on the substrates was removed by an in-situ etch. The metal films were deposited by electron-beam evaporation in ultra-high vacuum. The substrates were heated by thermal contact with an electron-bombarded backing plate. The deposition parameters are summarized in Table 1.The films were replicated and examined by electron microscopy and their crystallographic orientation and texture were determined by reflection electron diffraction. Verneuil-grown and Czochralskigrown sapphire substrates of both orientations were employed for each evaporation. The orientation of the metal deposit was not affected by either increasing the density of sub-grain boundaries by about a factor of ten or decreasing the deposition rate by a factor of two. The results on growth epitaxy are summarized in Tables 2 and 3.

(111) Monocrystalline Nickel Films

1972 ◽  
Vol 30 ◽  
pp. 512-513
Author(s):  
T.E. Pratt ◽  
R.W. Vook
Keyword(s):  
Film Thickness ◽  
Deposition Rate ◽  
Room Temperature ◽  
Narrow Range ◽  
High Vacuum ◽  
Residual Pressure ◽  
Temperature Dependent ◽  
Deposition Parameters ◽  
Transmission Electron ◽  
Substrate Temperatures

(111) oriented thin monocrystalline Ni films have been prepared by vacuum evaporation and examined by transmission electron microscopy and electron diffraction. In high vacuum, at room temperature, a layer of NaCl was first evaporated onto a freshly air-cleaved muscovite substrate clamped to a copper block with attached heater and thermocouple. Then, at various substrate temperatures, with other parameters held within a narrow range, Ni was evaporated from a tungsten filament. It had been shown previously that similar procedures would yield monocrystalline films of CU, Ag, and Au.For the films examined with respect to temperature dependent effects, typical deposition parameters were: Ni film thickness, 500-800 A; Ni deposition rate, 10 A/sec.; residual pressure, 10-6 torr; NaCl film thickness, 250 A; and NaCl deposition rate, 10 A/sec. Some additional evaporations involved higher deposition rates and lower film thicknesses.Monocrystalline films were obtained with substrate temperatures above 500° C. Below 450° C, the films were polycrystalline with a strong (111) preferred orientation.

Observations on the growth of YBa2Cu3O7-δ thin films on MgO by pulsed-laser ablation

1991 ◽  
Vol 49 ◽  
pp. 1068-1069
Author(s):  
M. Grant Norton ◽  
C. Barry Carter
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Laser Ablation ◽  
Substrate Surface ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Ablation Process ◽  
Deposition Parameters

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.

Tribological Performance and Action Mechanism of Cadmium Dialkyldithiophosphate

2005 ◽  
Vol 48 (2) ◽  
pp. 171-175 ◽  
Author(s):  
Hu Jianqiang ◽  
Wei Xianyong ◽  
Yao Junbing ◽  
Xie Feng ◽  
Zhu Huanqin ◽  
...  
Keyword(s):  
Tribological Performance ◽  
Action Mechanism

Using Statistical Methods to Optimize Patterning Parameters for Tungsten Deposition

2007 ◽  
Author(s):  
Michael DiBattista ◽  
Kimball Skinner ◽  
Rick Kneedler ◽  
Leonid Vasilvey ◽  
Lukas Drybcak ◽  
...  
Keyword(s):  
Failure Analysis ◽  
Statistical Methods ◽  
Deposition Rates ◽  
Low Resistivity ◽  
Material Deposition ◽  
Deposition Parameters ◽  
Beam Parameters

Abstract Circuit edit and failure analysis require tungsten deposition parameters to accomplish different goals. Circuit edit applications desire low resistivity values for rewiring, while failure analysis requires high deposition rates for capping layers. Tungsten deposition can be a well controlled process for a variety of beam parameters. For circuit edit, tungsten resistivity approaching below 150 µohm-cm and 50 μm3/nC is predicted. Material deposition rates of 80 μm3/nC can be achieved with reasonable pattern accuracy using defocus as a parameter.

scholarly journals Effect of Deposition Parameters on Electrochemical Properties of Polypyrrole-Graphene Oxide Films

Materials ◽  
2020 ◽  
Vol 13 (3) ◽  
pp. 624 ◽  
Author(s):  
Alina Iuliana Pruna ◽  
Nelly Ma. Rosas-Laverde ◽  
David Busquets Mataix
Keyword(s):  
Cyclic Voltammetry ◽  
Graphene Oxide ◽  
Electrochemical Properties ◽  
Sodium Dodecyl ◽  
Hybrid Coatings ◽  
Deposition Parameters ◽  
Structure Morphology ◽  
Energy Storage Applications ◽  
Improved Performance ◽  
Sds Surfactant

Graphene oxide (GO)-modified polypyrrole (PPy) coatings were obtained by electrochemical methods in the presence of the anionic surfactant, sodium dodecyl sulfate (SDS). The structure, morphology, and electrochemical properties of the coatings were assessed by Fourier transform infrared (FTIR) spectroscopy, Raman spectroscopy, scanning electron microscopy (SEM) and cyclic voltammetry at varying scan rates, respectively. The properties of the obtained coatings were analyzed with the GO and PPy loadings and electrodeposition mode. The hybrid coatings obtained galvanostatically showed a coarser appearance than those deposited by cyclic voltammetry CV mode and improved performance, respectively, which was further enhanced by GO and PPy loading. The capacitance enhancement can be attributed to the SDS surfactant that well dispersed the GO sheets, thus allowing the use of lower GO content for improved contribution, while the choice of suitable electrodeposition parameters is highly important for improving the applicability of GO-modified PPy coatings in energy storage applications.

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