An inductively coupled plasma metal organic chemical vapor deposition based on showerhead structure for low temperature growth
Zixuan Zhang
◽
Yi Luo
◽
Jiadong Yu
◽
Xiang Li
◽
Jian Wang
◽
...
2009 ◽
Vol 517
(15)
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pp. 4432-4435
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Ju-Hoon Park
◽
Chang-Bae Lee
◽
Il-Soo Kim
◽
Seong-Joo Jang
◽
Byung-Teak Lee
1997 ◽
Vol 310
(1-2)
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pp. 75-80
◽
G.-R. Bai
◽
A. Wang
◽
C.M. Foster
◽
J. Vetrone
G.R. Bai
◽
A. Wang
◽
C.M. Foster
◽
J. Vetrone
◽
J. Patel
◽
...
1993 ◽
Vol 42
(1-2)
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pp. 111-115
Keiichi Kanehori
◽
Nobuyuki Sugii
◽
Shin'Ichiro Saito
2004 ◽
Vol 78
(1)
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pp. 25-28
◽
B.P. Zhang
◽
N.T. Binh
◽
K. Wakatsuki
◽
N. Usami
◽
Y. Segawa
2007 ◽
Vol 515
(5)
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pp. 2921-2925
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Chunyu Wang
◽
Volker Cimalla
◽
Genady Cherkashinin
◽
Henry Romanus
◽
Majdeddin Ali
◽
...
2010 ◽
Vol 97
(5)
◽
pp. 053502
◽
S. Tan
◽
S. L. Selvaraj
◽
T. Egawa
Minsoo Kang
◽
Hyun-Jun Chai
◽
Han Beom Jeong
◽
Cheolmin Park
◽
In-young Jung
◽
...
2021 ◽
Vol 32
(19)
◽
pp. 195206
Jaeseo Park
◽
Hyeji Park
◽
Suho Park
◽
Nguyen Thi Thuy
◽
Jihun Mun
◽
...
1999 ◽
Vol 17
(3)
◽
pp. 1101
◽
Jean E. Kelsey
◽
Cindy Goldberg
◽
Guillermo Nuesca
◽
Gregory Peterson
◽
Alain E. Kaloyeros
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...