scholarly journals Rapid Coarsening of Ion Beam Ripple Patterns by Defect Annihilation

2009 ◽  
Vol 102 (14) ◽  
Author(s):  
Henri Hansen ◽  
Alex Redinger ◽  
Sebastian Messlinger ◽  
Georgiana Stoian ◽  
Joachim Krug ◽  
...  
2014 ◽  
Vol 14 (3) ◽  
pp. 312-317 ◽  
Author(s):  
Tanuj Kumar ◽  
U.B. Singh ◽  
Manish Kumar ◽  
Sunil Ojha ◽  
D. Kanjilal

2021 ◽  
Vol 22 (10) ◽  
pp. 5142
Author(s):  
Marcel Hanke ◽  
Yu Yang ◽  
Yuxin Ji ◽  
Guido Grundmeier ◽  
Adrian Keller

The effects that solid–liquid interfaces exert on the aggregation of proteins and peptides are of high relevance for various fields of basic and applied research, ranging from molecular biology and biomedicine to nanotechnology. While the influence of surface chemistry has received a lot of attention in this context, the role of surface topography has mostly been neglected so far. In this work, therefore, we investigate the aggregation of the type 2 diabetes-associated peptide hormone hIAPP in contact with flat and nanopatterned silicon oxide surfaces. The nanopatterned surfaces are produced by ion beam irradiation, resulting in well-defined anisotropic ripple patterns with heights and periodicities of about 1.5 and 30 nm, respectively. Using time-lapse atomic force microscopy, the morphology of the hIAPP aggregates is characterized quantitatively. Aggregation results in both amorphous aggregates and amyloid fibrils, with the presence of the nanopatterns leading to retarded fibrillization and stronger amorphous aggregation. This is attributed to structural differences in the amorphous aggregates formed at the nanopatterned surface, which result in a lower propensity for nucleating amyloid fibrillization. Our results demonstrate that nanoscale surface topography may modulate peptide and protein aggregation pathways in complex and intricate ways.


MRS Advances ◽  
2019 ◽  
Vol 4 (28-29) ◽  
pp. 1673-1682 ◽  
Author(s):  
R. P. Yadav ◽  
Vandana ◽  
Jyoti Malik ◽  
Jyoti Yadav ◽  
A. K. Mittal ◽  
...  

AbstractNano-patterned surfaces have potential applications in the development of efficient solar cells through multiple internal reflections and may be used to fulfil the energy demand of rural India. Therefore, the basic understanding of growth mechanism of patterns under ion irradiation is much required. Here, the ripple patterns are grown on Si (100) surfaces for two specific ion irradiation conditions. First, the two set of samples (namely set-A and set-B) of Si (100) are irradiated by 50 keVAr+ ion beam at oblique (60°) and normal incidence, respectively, using ion fluence of 5×1016 ions/ cm2. The aim of this first stage irradiation at two different angles is the creation of different depth locations of amorphous/crystalline (a/c) interface while keeping the free surface similar in surface features, which is a crucial parameter in surface growth. Further, the sequential second stage irradiation is carried out at 60° for the same energy of Ar beam for the fluences 3×1017 to 9×1017 ions/cm2 to see the evolution of ripple patterns. Atomic force microscopy (AFM) study shows that the ripple pattern ordering is better in set-A rather than set-B. Lateral correlation length of each ripple structure surface is computed by autocorrelation function while roughness exponent is measured with height-height correlation function. Fractals behaviors of patterned on Si (100) surface are found to be sensitive to the two stage irradiation approach. The understanding of the mechanism of nano-patterns formation may be useful to develop efficient solar systems for the needs of energy in rural India.


2007 ◽  
Vol 1059 ◽  
Author(s):  
Rodolfo Cuerno ◽  
Javier Muñoz-García ◽  
Mario Castro ◽  
Raúl Gago ◽  
Luis Vázquez

ABSTRACTA “hydrodynamic” model has been proposed to describe nanopattern formation and dynamics on amorphous surfaces eroded by ion-beam sputtering (IBS), that relates to descriptions of pattern formation in macroscopic systems such as aeolian sand dunes. At variance with previous continuum models of the morphology of ion-sputtered surfaces, the dynamics of the species that diffuse along the surface is coupled in a natural way to that of the surface height. We report recent results for this model, considering normal and oblique ion incidence, for both fixed and rotating targets, and include comparison to recent experiments on silicon. Effective interface equations can be obtained, that generalize the anisotropic Kuramoto-Sivashinshy equation through additional conserved Kardar-Parisi-Zhang type nonlinear terms. In general dot or ripple patterns form, that later evolve exhibiting complex nonlinear dynamics. Thus, we observe interrupted coarsening behavior such that, for normal incidence, domains of hexagonally ordered structures appear, that compare favorably with those obtained in many experiments of nanodot formation by IBS. In other parameter regions, this short-range ordered patterns coexist with long range disorder and kinetic roughening. For oblique incidence, a ripple pattern is generically obtained that also shows interrupted coarsening and other nonlinear features like non-uniform transverse motion, again reproducing experimental observations.


Crystals ◽  
2019 ◽  
Vol 9 (9) ◽  
pp. 453
Author(s):  
Redondo-Cubero ◽  
Vázquez ◽  
Jalabert ◽  
Lorenz ◽  
Sedrine

Here, we report on the production of nanoripples on the surface of ZnO bulk substrates by ion beam erosion with 20 keV Ar+ ions at an oblique incidence (60°). The ripple patterns, analyzed by atomic force microscopy, follow a power law dependence for both the roughness and the wavelength. At high fluences these ripples show coarsening and asymmetric shapes, which become independent of the beam direction and evidence additional mechanisms for the pattern development. The shallow damaged layer is not fully amorphized by this process, as confirmed by medium energy ion scattering. A detailed study of the damage-induced changes on the optical properties was carried out by means of spectroscopic ellipsometry. Using a 3-layer model based on Tauc-Lorenz and critical point parameter band oscillators, the optical constants of the damaged layer were determined. The results showed a progressive reduction in the refractive index and enhanced absorption below the bandgap with the fluence.


Author(s):  
J. S. Maa ◽  
Thos. E. Hutchinson

The growth of Ag films deposited on various substrate materials such as MoS2, mica, graphite, and MgO has been investigated extensively using the in situ electron microscopy technique. The three stages of film growth, namely, the nucleation, growth of islands followed by liquid-like coalescence have been observed in both the vacuum vapor deposited and ion beam sputtered thin films. The mechanisms of nucleation and growth of silver films formed by ion beam sputtering on the (111) plane of silicon comprise the subject of this paper. A novel mode of epitaxial growth is observed to that seen previously.The experimental arrangement for the present study is the same as previous experiments, and the preparation procedure for obtaining thin silicon substrate is presented in a separate paper.


Author(s):  
P.G. Pawar ◽  
P. Duhamel ◽  
G.W. Monk

A beam of ions of mass greater than a few atomic mass units and with sufficient energy can remove atoms from the surface of a solid material at a useful rate. A system used to achieve this purpose under controlled atmospheres is called an ion miliing machine. An ion milling apparatus presently available as IMMI-III with a IMMIAC was used in this investigation. Unless otherwise stated, all the micro milling operations were done with Ar+ at 6kv using a beam current of 100 μA for each of the two guns, with a specimen tilt of 15° from the horizontal plane.It is fairly well established that ion bombardment of the surface of homogeneous materials can produce surface topography which resembles geological erosional features.


Author(s):  
Dudley M. Sherman ◽  
Thos. E. Hutchinson

The in situ electron microscope technique has been shown to be a powerful method for investigating the nucleation and growth of thin films formed by vacuum vapor deposition. The nucleation and early stages of growth of metal deposits formed by ion beam sputter-deposition are now being studied by the in situ technique.A duoplasmatron ion source and lens assembly has been attached to one side of the universal chamber of an RCA EMU-4 microscope and a sputtering target inserted into the chamber from the opposite side. The material to be deposited, in disc form, is bonded to the end of an electrically isolated copper rod that has provisions for target water cooling. The ion beam is normal to the microscope electron beam and the target is placed adjacent to the electron beam above the specimen hot stage, as shown in Figure 1.


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