Imaging X-ray fluorescence microscope with a Wolter-type grazing-incidence mirror

A Wolter-type grazing-incidence mirror was used as an objective for an imaging X-ray fluorescence microscope. The microscope was constructed at the beamline 6C2 of the Photon Factory. The shortest wavelength used was ∼0. 1 nm, which was limited by the grazing-incidence angle of the mirror. To demonstrate the possibility of recording X-ray fluorescence images, several fine grids were used as test specimens. Characteristic X-rays emitted from each specimen could be clearly imaged. Spatial resolution was estimated to be better than 10 µm.

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Generalized grazing-incidence-angle X-ray diffraction (G-GIXD) using image plates

Journal of Synchrotron Radiation ◽

10.1107/s090904959800123x ◽

1998 ◽

Vol 5 (3) ◽

pp. 488-490 ◽

Cited By ~ 5

Author(s):

Yasuo Takagi ◽

Masao Kimura

Keyword(s):

Incidence Angle ◽

Incident Beam ◽

Grazing Incidence ◽

X Rays ◽

X Ray Diffraction ◽

X Ray ◽

Surface And Interface ◽

Out Of Plane ◽

Grazing Incidence Angle ◽

Interface Layers

A new and more `generalized' grazing-incidence-angle X-ray diffraction (G-GIXD) method which enables simultaneous measurements both of in- and out-of-plane diffraction images from surface and interface structures has been developed. While the method uses grazing-incidence-angle X-rays like synchrotron radiation as an incident beam in the same manner as in `traditional' GIXD, two-dimensional (area) detectors like image plates and a spherical-type goniometer are used as the data-collection system. In this way, diffraction images both in the Seemann–Bohlin (out-of-plane) and GIXD geometry (in-plane) can be measured simultaneously without scanning the detectors. The method can be applied not only to the analysis of the in-plane crystal structure of epitaxically grown thin films, but also to more general research topics like the structural analysis of polycrystalline mixed phases of thin surface and interface layers.

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Characterization of Interfacial Roughness in Semiconductor Heterostructures by X-Ray Reflectivity

MRS Proceedings ◽

10.1557/proc-103-355 ◽

1987 ◽

Vol 103 ◽

Author(s):

A. Krol ◽

C. J. Sher ◽

H. Resat ◽

S. C. Woronick ◽

W. Ng ◽

...

Keyword(s):

Molecular Beam Epitaxy ◽

Molecular Beam ◽

Incidence Angle ◽

Grazing Incidence ◽

Semiconductor Heterostructures ◽

X Rays ◽

Interfacial Roughness ◽

X Ray ◽

Grazing Incidence Angle

ABSTRACTThe reflection of monochromatic x-rays by a layered heterostructure can be utilized as a nondestructive probe to obtain information on the interfacial roughness in the material. Interference between x-rays reflected from the top surface and the interfaces can give rise to pronounced oscillations in the reflectivity as a function of the grazing incidence angle. We have made use of this technique to investigate the interfacial roughness in semiconductor heterostructures grown by molecular beam epitaxy.

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Design and Analysis of Hard X-Ray Microscope Employing Toroidal Mirrors Working at Grazing-Incidence

International Journal of Pattern Recognition and Artificial Intelligence ◽

10.1142/s0218001420550101 ◽

2019 ◽

Vol 34 (04) ◽

pp. 2055010

Author(s):

Ying Cui ◽

Yadong Yan ◽

Bingjing Wu ◽

Qi Li ◽

Junhua He

Keyword(s):

Optical Axis ◽

Incidence Angle ◽

Incident Angle ◽

Optical Design ◽

Grazing Incidence ◽

Imaging Diagnosis ◽

X Ray ◽

Imaging Characteristics ◽

Axis Offset ◽

Better Than

A high resolution microscope is designed for plasma hard X-ray (10–20[Formula: see text]keV) imaging diagnosis. This system consists of two toroidal mirrors, which are nearly parallel, with an angle twice that of the grazing incidence angle and a plane mirror for spectral selection and correction of optical axis offset. The imaging characteristics of single toroidal mirror and double mirrors are analyzed in detail by the optical path function. The optical design, parameter optimization, image quality simulation and analysis of the microscope are carried out. The optimized hard X-ray microscope has a resolution better than 5[Formula: see text][Formula: see text]m at 1[Formula: see text]mm object field of view. The experimental data shows that the variation of the resolution is smaller in the direction of incident angle decrease than that in the increasing direction.

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Determination of the Fe layer structure in Fe/Ru superlattices by grazing incidence angle X-ray diffraction

Journal of Magnetism and Magnetic Materials ◽

10.1016/0304-8853(95)00126-3 ◽

1995 ◽

Vol 148 (1-2) ◽

pp. 9-10 ◽

Cited By ~ 2

Author(s):

M.C. Saint-Lager ◽

M. Brunel ◽

D. Raoux ◽

M. Piecuch

Keyword(s):

Layer Structure ◽

Incidence Angle ◽

Grazing Incidence ◽

X Ray Diffraction ◽

X Ray ◽

Grazing Incidence Angle

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A Precision Grazing-incidence Angle Error Measurement of a Hard X-ray Condenser Mirror Using Single-grating Interferometry

Synchrotron Radiation News ◽

10.1080/08940886.2013.832585 ◽

2013 ◽

Vol 26 (5) ◽

pp. 13-16 ◽

Cited By ~ 10

Author(s):

Ryosuke Fukui ◽

Jangwoo Kim ◽

Satoshi Matsuyama ◽

Hirokatsu Yumoto ◽

Yuichi Inubushi ◽

...

Keyword(s):

Incidence Angle ◽

Grazing Incidence ◽

Error Measurement ◽

Angle Error ◽

X Ray ◽

Grazing Incidence Angle

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Structural Characterization of GaN Epilayers Grown on Patterned Sapphire Substrates

MRS Proceedings ◽

10.1557/proc-864-e4.8 ◽

2005 ◽

Vol 864 ◽

Author(s):

Chang-Soo Kim ◽

Ji-Hyun Moon ◽

Sang-Jun Lee ◽

Sam-Kyu Noh ◽

Je Won Kim ◽

...

Keyword(s):

Incidence Angle ◽

Surface Region ◽

Grazing Incidence ◽

X Rays ◽

X Ray Diffraction ◽

X Ray ◽

Patterned Substrate ◽

Sapphire Substrates ◽

Patterned Sapphire Substrates

AbstractThe structural properties of GaN epitaxial layers grown on patterned sapphire substrates by MOCVD have been investigated using HRXRD(high-resolution X-ray diffraction), GIXRD(grazing incidence X-ray diffraction) and PL(photoluminescence). For X-ray characterizations rocking curves for GaN (10·5), (00·2), (11·4) and (11·0) reflections for which incidence angles of X-rays are 32.0°, 17.3°, 11.0° and 0.34°, respectively, were measured. For (10·5), (00·2) and (11·4) reflections FWHMs of the rocking curves for a patterned substrate were broader than those for a unpatterned substrate, for (11·0) reflection, however, FWHM for a patterned substrate was much narrower than that for a unpatterned substrate. The normalized FWHM for all reflections decreases as the incidence angle of X-ray decreases. The results indicate that the crystalline quality in the surface region of the epilayer on a patterned substrate was especially improved because the penetration depth of X-ray depends on the incidence angle. The intensity of PL peak of the epilayer for a patterned substrate increased compared to that for a unpatterned substrate, and the increase in PL intensity is attributed to the reduction in dislocation density at the surface region revealed the by X-ray results.

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Grazing Incidence angle X-ray Diffraction of implanted stainless steel: comparison between simulated data and experimental data

10.1063/1.2401511 ◽

2006 ◽

Author(s):

J. Dudognon ◽

M. Vayer ◽

A. Pineau ◽

R. Erre

Keyword(s):

Experimental Data ◽

Stainless Steel ◽

Incidence Angle ◽

Simulated Data ◽

Grazing Incidence ◽

X Ray Diffraction ◽

X Ray ◽

Grazing Incidence Angle

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Interface-sensitive imaging by an image reconstruction aided X-ray reflectivity technique

Journal of Applied Crystallography ◽

10.1107/s160057671700509x ◽

2017 ◽

Vol 50 (3) ◽

pp. 712-721 ◽

Cited By ~ 5

Author(s):

Jinxing Jiang ◽

Keiichi Hirano ◽

Kenji Sakurai

Keyword(s):

Ultrathin Films ◽

Incidence Angle ◽

Grazing Incidence ◽

Two Dimensional ◽

Plane Angle ◽

Pixel Size ◽

Parallel Beam ◽

X Ray ◽

Area Detector ◽

Grazing Incidence Angle

Recently, the authors have succeeded in realizing X-ray reflectivity imaging of heterogeneous ultrathin films at specific wavevector transfers by applying a wide parallel beam and an area detector. By combining in-plane angle and grazing-incidence angle scans, it is possible to reconstruct a series of interface-sensitive X-ray reflectivity images at different grazing-incidence angles (proportional to wavevector transfers). The physical meaning of a reconstructed X-ray reflectivity image at a specific wavevector transfer is the two-dimensional reflectivity distribution of the sample. In this manner, it is possible to retrieve the micro-X-ray reflectivity (where the pixel size is on the microscale) profiles at different local positions on the sample.

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