Correlation between two time-dependent dielectric breakdown measurements for the gate oxides damaged by plasma processing
1998 ◽
Vol 45
(1)
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pp. 160-164
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2017 ◽
Vol 56
(6S2)
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pp. 06HD03
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1999 ◽
Vol 14
(10)
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pp. 892-896
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2011 ◽
Vol 88
(7)
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pp. 1376-1379
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Keyword(s):
2021 ◽
Vol 68
(5)
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pp. 2220-2225
Keyword(s):
2007 ◽
Vol 46
(No. 28)
◽
pp. L691-L692
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Keyword(s):