Analysis of the nitrogen ion beam generated in a low-energy plasma focus device by a Faraday cup operating in the secondary electron emission mode

1998 ◽  
Vol 26 (1) ◽  
pp. 113-117 ◽  
Author(s):  
H. Kelly ◽  
A. Lepone ◽  
A. Marquez ◽  
M.J. Sadowski ◽  
J. Baranowski ◽  
...  
Keyword(s):  
Plasma Focus ◽  
Electron Emission ◽  
Secondary Electron ◽  
Ion Beam ◽  
Secondary Electron Emission ◽  
Low Energy ◽  
Plasma Focus Device ◽  
Faraday Cup ◽  
Emission Mode ◽  
Nitrogen Ion

Development of Multi Faraday Cup Assembly for Ion Beam Measurements from a Low Energy Plasma Focus Device

2005 ◽  
Vol 44 (7A) ◽  
pp. 5199-5205 ◽  
Author(s):  
Smruti Ranjan Mohanty ◽  
Heman Bhuyan ◽  
Nirod Kumar Neog ◽  
Rabindra Kumar Rout ◽  
Eiki Hotta
Keyword(s):  
Plasma Focus ◽  
Ion Beam ◽  
Low Energy ◽  
Plasma Focus Device ◽  
Faraday Cup

SEM analysis of DC magnetron sputtered beryllium films

1988 ◽  
Vol 46 ◽  
pp. 960-961
Author(s):  
E. F. Lindsey ◽  
C. W. Price ◽  
E. L. Pierce ◽  
E. J. Hsieh
Keyword(s):  
Fine Structure ◽  
Electron Emission ◽  
Secondary Electron ◽  
Low Voltage ◽  
Ion Beam ◽  
Secondary Electron Emission ◽  
Sem Analysis ◽  
Fused Silica ◽  
Grain Structure ◽  
Silica Substrate

Columnar structures produced by DC magnetron sputtering can be altered by using RF biased sputtering or by exposing the film to nitrogen pulses during sputtering, and these techniques are being evaluated to refine the grain structure in sputtered beryllium films deposited on fused silica substrates. Beryllium is brittle, and fractures in sputtered beryllium films tend to be intergranular; therefore, a convenient technique to analyze grain structure in these films is to fracture the coated specimens and examine them in an SEM. However, fine structure in sputtered deposits is difficult to image in an SEM, and both the low density and the low secondary electron emission coefficient of beryllium seriously compound this problem. Secondary electron emission can be improved by coating beryllium with Au or Au-Pd, and coating also was required to overcome severe charging of the fused silica substrate even at low voltage. The coating structure can obliterate much of the fine structure in beryllium films, but reasonable results were obtained by using the high-resolution capability of an Hitachi S-800 SEM and either ion-beam coating with Au-Pd or carbon coating by thermal evaporation.

Nitrogen ion spectrum from a low energy plasma focus device

1997 ◽  
Vol 25 (3) ◽  
pp. 455-459 ◽  
Author(s):  
H. Kelly ◽  
A. Lepone ◽  
A. Marquez
Keyword(s):  
Plasma Focus ◽  
Low Energy ◽  
Plasma Focus Device ◽  
Nitrogen Ion
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