A mathematical model for online electrical characterization of thermoelectric generators using the P-I curves at different temperatures

Author(s):  
Eduardo I. Ortiz-Rivera ◽  
Andres Salazar-Llinas ◽  
Jesus Gonzalez-Llorente
2013 ◽  
Vol 19 (S2) ◽  
pp. 456-457
Author(s):  
M. Rudneva ◽  
T. Kozlova ◽  
H.W. Zandbergen

Extended abstract of a paper presented at Microscopy and Microanalysis 2013 in Indianapolis, Indiana, USA, August 4 – August 8, 2013.


2013 ◽  
Author(s):  
D. Berman-Mendoza ◽  
D. Quiñones-Urías ◽  
S. Ferra-González ◽  
A. Vera-Marquina ◽  
A. Rojas-Hernández ◽  
...  

1996 ◽  
Vol 427 ◽  
Author(s):  
F. La Via ◽  
E. Rimini

AbstractUltra-Shallow p+/n and n+/p junctions were fabricated using a Silicide-As-Diffusion-Source (SADS) process and a low thermal budget (800÷900 °C). A thin layer (50 nm) of CoSi2 was implanted with As and BF2 and subsequently diffused at different temperatures and times to form two Ultra-Shallow junctions with a junction depth of 14 and 20 nm. These diodes were extensively investigated by I-V and C-V measurements in the range of temperature between 80 and 500 K. TEM delineation was used to controll the junction uniformity.


2009 ◽  
Vol 1178 ◽  
Author(s):  
Olivia Maria Berengue ◽  
Cleocir J. Dalmaschio ◽  
Tiago G. Conti ◽  
Adenilson J. Chiquito ◽  
Edson R. Leite

AbstractSn3O4 nanobelts were grown by a carbothermal evaporation process of SnO2 powders in association with the well known vapour-solid mechanism (VS). The nanobelts crystal structure was investigated by x-ray diffraction (XRD), high resolution transmission electron microscopy (HRTEM), raman spectroscopy and field emission gun scanning electron microscopy (FEG-SEM). The structural and morphological characterization has confirmed the growth of single crystal nanobelts. The electrical characterization (current-voltage, temperature-dependent resistance curves) of individual Sn3O4 nanobelts was performed at different temperatures and light excitation. The experiments revealed a semiconductor – like character as evidenced by the resistance decreasing at high temperatures. The transport mechanism was identified as the variable range hopping.


2006 ◽  
Vol 957 ◽  
Author(s):  
Andre Krtschil ◽  
Armin Dadgar ◽  
Annette Diez ◽  
Alois Krost

ABSTRACTP- and n-type conductivity domains in dual-doped ZnO:As+N layers grown by metal organic vapor phase epitaxy on GaN/sapphire templates were electrically microcharacterized by scanning capacitance (SCM) and scanning surface potential microscopy (SSPM) techniques with respect to their defect states. The p-type domains were found to be dominated by two acceptors with thermal activation energies of about 80 and 270 meV as observed by transient SCM scans at different temperatures. Optically excited SSPM scans revealed defect-to-band-transitions at 400, 459, and 505 nm omnipresent in both domain types as well as a shallower transition at 377 nm exclusively in the p-type regions. According to the similar energy levels the optical transitions at 377 and 400 nm are assigned to acceptor states, whereby the 80meV-acceptor is probably responsible for the conversion from n- to p-type in the domains.


2007 ◽  
Vol 22 (7) ◽  
pp. 1775-1778 ◽  
Author(s):  
Andre Krtschil ◽  
Armin Dadgar ◽  
Annette Diez ◽  
Alois Krost

P- and n-type conductivity domains in dual-doped ZnO:As+N layers grown by metal organic vapor phase epitaxy on GaN–sapphire templates were electrically microcharacterized by scanning capacitance microscopy (SCM) and scanning surface potential microscopy (SSPM) techniques with respect to their defect states. The p-type domains were found to be dominated by two acceptors with thermal activation energies of about 80 and 270 meV, as observed by transient SCM scans at different temperatures. Optically excited SSPM scans revealed defect-to-band transitions at 400, 459, and 505 nm omnipresent in both domain types as well as a shallower transition at 377 nm exclusively in the p-type regions. According to the similar energy levels, the optical transitions at 377 and 400 nm are assigned to acceptor states, whereby the 80-meV acceptor is probably responsible for the conversion from n- to p-type regions in the domains.


2013 ◽  
Vol 685 ◽  
pp. 179-184
Author(s):  
M.A. Benamara ◽  
A. Talbi ◽  
Z. Benamara ◽  
B. Akkal ◽  
N. Chabane Sari ◽  
...  

Superscript textThe III-V semiconductors materials and in particularly Indium Phosphide are a promising candidates for the elaboration of high speed electronic compounds. The importance of the interface study is increasing considerably in the last years to understand, the mechanism of interface formations and to control perfectly the technology of the elaborated compounds. This study presents an electrical characterization of InP(p)/InSb/Al2O3/ Au structures in the range of temperature varying from the temperature of liquid nitrogen to the temperature of 400°K. In order to give the evolution of electrical parameters of these structures with temperature, we have realized Capacitance-Voltage measurements at high frequency for different temperatures. The found results show that there is dispersion in the accumulation region as function with temperature. The quantity of positive charges in the insulator is estimated to 1.37×1012 atm/cm2 at room temperature. This value decreases slightly with increasing temperature. It varies fromSuperscript text 1.57×1012 atm/cm2 at 77°K to 1.12×1012 atm/cm2 at 400°K. The interface insulator/semiconductor of our samples presents a good electronical quality, the state density is equal to 4.1011 eV-1.cm-2 at room temperature, this one increases from 4.7×1010 eV-1.cm-2 to 7.1011 eV-1.cm-2 when temperature increases from 77°K to 400°K.


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