Identification of Adhesive Quality of Multi-interface Adhesive Members

Author(s):  
Runjing Zhou ◽  
Nan Li
Keyword(s):  
Author(s):  
Xiao-li Li ◽  
Jiangang Sun ◽  
Ning Tao ◽  
Lichun Feng ◽  
Jing-ling Shen ◽  
...  

2019 ◽  
Vol 25 ◽  
pp. 292-295 ◽  
Author(s):  
Fahad Alkhudhairy ◽  
Mustafa Naseem ◽  
Zeeshan H Ahmad ◽  
Abrar N Alnooh ◽  
Fahim Vohra

Dental Update ◽  
2021 ◽  
Vol 48 (7) ◽  
pp. 592-593
Author(s):  
Javed Ikram ◽  
Nabeel Essa

Various methods exist for taking implant impressions. The open-tray or pick-up impression technique is one of the conventional methods for transferring the impression coping from the implant to the impression. In this method, a window directly above the implant is made in a stock or custom tray to allow access to the impression coping. Traditionally, the window is either left open, or closed with melted wax or foil. This technique tip describes a modification to create a stable and secure seal over the opening using rayon-based adhesive tapes. The benefits of this modification over the conventional open-tray technique are due to the enhanced adhesive quality of the materials to metal or plastic. Because there is less chance of impression material leaking from the tray window into the mouth, it is more comfortable for patients and less messy for clinicians. The benefit of this method over the closed-tray technique is the ability to feel for the head of the impression coping at the same time as making sure the impression material is in good contact with the underlying structures. It is easy to use, and efficient in terms of time and cost.


1922 ◽  
Vol 23 (7) ◽  
pp. 387-392 ◽  
Author(s):  
Warren H. Lewis
Keyword(s):  

2010 ◽  
Vol 35 (6) ◽  
pp. 689-696 ◽  
Author(s):  
S. P. Passos ◽  
L. G. May ◽  
D. C. Barca ◽  
M. Özcan ◽  
M. A. Bottino ◽  
...  

Clinical Relevance Chairside tribochemical silica coating and silanization on the YTZP surface appears to be essential to adhere this substrate to resin cements. Cleaning with isopropanol promotes weak and unstable resin adhesion.


Author(s):  
K. T. Tokuyasu

During the past investigations of immunoferritin localization of intracellular antigens in ultrathin frozen sections, we found that the degree of negative staining required to delineate u1trastructural details was often too dense for the recognition of ferritin particles. The quality of positive staining of ultrathin frozen sections, on the other hand, has generally been far inferior to that attainable in conventional plastic embedded sections, particularly in the definition of membranes. As we discussed before, a main cause of this difficulty seemed to be the vulnerability of frozen sections to the damaging effects of air-water surface tension at the time of drying of the sections.Indeed, we found that the quality of positive staining is greatly improved when positively stained frozen sections are protected against the effects of surface tension by embedding them in thin layers of mechanically stable materials at the time of drying (unpublished).


Author(s):  
L. D. Jackel

Most production electron beam lithography systems can pattern minimum features a few tenths of a micron across. Linewidth in these systems is usually limited by the quality of the exposing beam and by electron scattering in the resist and substrate. By using a smaller spot along with exposure techniques that minimize scattering and its effects, laboratory e-beam lithography systems can now make features hundredths of a micron wide on standard substrate material. This talk will outline sane of these high- resolution e-beam lithography techniques.We first consider parameters of the exposure process that limit resolution in organic resists. For concreteness suppose that we have a “positive” resist in which exposing electrons break bonds in the resist molecules thus increasing the exposed resist's solubility in a developer. Ihe attainable resolution is obviously limited by the overall width of the exposing beam, but the spatial distribution of the beam intensity, the beam “profile” , also contributes to the resolution. Depending on the local electron dose, more or less resist bonds are broken resulting in slower or faster dissolution in the developer.


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