Influence of substrate bias on the resistivity and TCR of nanostructured Ta-Si-N films

Author(s):  
C.K. Chung ◽  
Y.L. Chang ◽  
T.S. Chen
1993 ◽  
Vol 164-166 ◽  
pp. 1127-1130 ◽  
Author(s):  
S. Xu ◽  
M. Hundhausen ◽  
J. Ristein ◽  
B. Yan ◽  
L. Ley

2012 ◽  
Author(s):  
A. Mallikarjuna Reddy ◽  
Ch. Seshendra Reddy ◽  
Y. Ashok Kumar Reddy ◽  
R. Lydia ◽  
P. Sreedhara Reddy ◽  
...  

2017 ◽  
Vol 31 (16-19) ◽  
pp. 1744032 ◽  
Author(s):  
X. Zuo ◽  
F. Xia ◽  
D. Zhang ◽  
P. L. Ke ◽  
Q. M. Wang ◽  
...  

Chromium nitride coatings were prepared by reactive DC-superimposed high-power-impulse magnetron sputtering (HiPIMS) system. The influence of substrate bias on the microstructure and mechanical properties of CrN coatings was investigated. XRD and cross-sectional SEM were utilized to characterize the film structures. Mechanical properties were characterized by nanoindentation and Vickers indentation test. The results revealed that the microstructure and mechanical properties of CrN coatings were affected by bias voltage. The CrN coatings exhibited dense and fine columnar grain structure with the hardness of about 18.7 GPa. The fracture toughness of CrN coatings was around 3.16 MPa ⋅ m[Formula: see text]. However, further increase of the bias voltage from −250 V to −300 V led to the degradation of coating properties.


2015 ◽  
Vol 24 (2) ◽  
pp. 028102 ◽  
Author(s):  
Hui-Min Li ◽  
Wei Yu ◽  
Yan-Mei Xu ◽  
Yun Ji ◽  
Zhao-Yi Jiang ◽  
...  

1981 ◽  
Vol 80 (1-3) ◽  
pp. 77-83 ◽  
Author(s):  
J.-E. Sundgren ◽  
B.-O. Johansson ◽  
S.-E. Karlsson

2009 ◽  
Vol 63 (26) ◽  
pp. 2181-2184 ◽  
Author(s):  
Joon Woo Bae ◽  
Jae-Won Lim ◽  
Kouji Mimura ◽  
Masahito Uchikoshi ◽  
Mitsuhiro Wada ◽  
...  

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