scholarly journals Characterization of electrothermal actuators and arrays fabricated in a four-level, planarized surface-micromachined polycrystalline silicon process

Author(s):  
J.H. Comtois ◽  
M.A. Michalicek ◽  
C.C. Barron
2006 ◽  
Vol 35 (6) ◽  
pp. 350-353
Author(s):  
P. A. Borodovskii ◽  
A. F. Buldygin ◽  
A. T. Drofa ◽  
A. S. Tokarev

2013 ◽  
Vol 205-206 ◽  
pp. 284-289 ◽  
Author(s):  
David Lysáček ◽  
Petr Kostelník ◽  
Petr Pánek

We report on a novel method of low pressure chemical vapor deposition of polycrystalline silicon layers used for external gettering in silicon substrate for semiconductor applications. The proposed method allowed us to produce layers of polycrystalline silicon with pre-determined residual stress. The method is based on the deposition of a multilayer system formed by two layers. The first layer is intentionally designed to have tensile stress while the second layer has compressive stress. Opposite sign of the residual stresses of the individual layers enables to pre-determine the residual stress of the gettering stack. We used scanning electron microscopy for structural characterization of the layers and intentional contamination for demonstration of the gettering properties. Residual stress of the layers was calculated from the wafer curvature.


1985 ◽  
Vol 125 (3-4) ◽  
pp. 235-241 ◽  
Author(s):  
P. Montaudon ◽  
M.H. Debroux ◽  
F. Ferrieu ◽  
A. Vareille

2007 ◽  
Vol 46 (1) ◽  
pp. 51-55 ◽  
Author(s):  
Genshiro Kawachi ◽  
Yoshiaki Nakazaki ◽  
Hiroyuki Ogawa ◽  
Masayuki Jyumonji ◽  
Noritaka Akita ◽  
...  

2001 ◽  
Vol 80-81 ◽  
pp. 367-372
Author(s):  
F.V. Farmakis ◽  
D.M. Tsamados ◽  
J. Brini ◽  
G. Kamarinos ◽  
C.A. Dimitriadis

Sign in / Sign up

Export Citation Format

Share Document