scholarly journals Analytic Model for the Surface Potential and Drain Current in Negative Capacitance Field-Effect Transistors

2010 ◽  
Vol 57 (10) ◽  
pp. 2405-2409 ◽  
Author(s):  
David Jimenez ◽  
Enrique Miranda ◽  
Andrés Godoy
RSC Advances ◽  
2016 ◽  
Vol 6 (105) ◽  
pp. 103210-103214 ◽  
Author(s):  
Y. G. Xiao ◽  
D. B. Ma ◽  
J. Wang ◽  
G. Li ◽  
S. A. Yan ◽  
...  

An improved model for the surface potential and drain current in negative capacitance ferroelectric field effect transistors (NC-FeFETs) was presented by introducing the doping concentration.


2021 ◽  
Author(s):  
Adeel Liaqat ◽  
Yiheng Yin ◽  
Sabir Hussain ◽  
Wen Wen ◽  
Juanxia Wu ◽  
...  

Abstract As scaling down the size of metal oxide semiconductor field-effect transistors (FETs), power dissipation has become a major challenge. Lowering the sub-threshold swing (SS) is known as an effective technique to decrease the operating voltage of FETs and hence lower down the power consumption. However, the Boltzmann distribution of electrons (so-called ‘Boltzmann tyranny’) implements a physical limit to the SS value. Use of negative capacitance (NC) effect has enabled a new path to achieve a low SS below the Boltzmann limit (60 mV/dec at room temperature). In this work, we have demonstrated a NC-FET from an all two-dimensional (2D) metal ferroelectric semiconductor (MFS) vertical heterostructure: Graphene/CuInP2S6/MoS2. The negative capacitance from the ferroelectric CuInP2S6 has enabled the breaking of the “Boltzmann tyranny”. The heterostructure-based device has shown steep slopes switching below 60 mV/dec (lowest to <10 mV/dec) over 3 orders of source-drain current, which provides an avenue for all 2D material based steep slope FETs.


1987 ◽  
Vol 65 (5) ◽  
pp. 1072-1078 ◽  
Author(s):  
Paul G. Glavina ◽  
D. Jed Harrison

The fabrication of ion sensitive field effect transistors (ISFET) and microelectrode arrays for use as chemical sensors using a commercial CMOS fabrication process is described. The commercial technology is readily available through the Canadian Microelectronics Corporation; however, several of the recommended design rules must be ignored in preparing chemical sensors using this process. The ISFET devices show near theoretical response to K+ in aqueous solution (55 mV slope) when coated with a K+ sensitive membrane. An extended gate ion sensitive device is presented which offers advantages in encapsulation of ISFET sensors. The source-drain current of both devices show a linear response to log [Formula: see text] in contrast to ISFETs previously reported that have high internal lead resistances. Al and poly-Si microelectrode arrays are fabricated commercially and then Pt is electrodeposited on the microelectrodes. The resulting arrays show good cyclic voltammetric response to Fe(CN)64− and Ru(NH3)63+ and are relatively durable.


2002 ◽  
Vol 743 ◽  
Author(s):  
Z. Y. Fan ◽  
J. Li ◽  
J. Y. Lin ◽  
H. X. Jiang ◽  
Y. Liu ◽  
...  

ABSTRACTThe fabrication and characterization of AlGaN/GaN metal-oxide-semiconductor heterostructure field-effect transistors (MOSHFETs) with the δ-doped barrier are reported. The incorporation of the SiO2 insulated-gate and the δ-doped barrier into HFET structures reduces the gate leakage and improves the 2D channel carrier mobility. The device has a high drain-current-driving and gate-control capabilities as well as a very high gate-drain breakdown voltage of 200 V, a cutoff frequency of 15 GHz and a maximum frequency of oscillation of 34 GHz for a gate length of 1 μm. These characteristics indicate a great potential of this structure for high-power-microwave applications.


Sign in / Sign up

Export Citation Format

Share Document