Source/Drain Engineered Charge-Plasma Junctionless Transistor for the Immune of Line Edge Roughness Effect

IEEE Transactions on Electron Devices ◽

10.1109/ted.2018.2812241 ◽

2018 ◽

Vol 65 (5) ◽

pp. 1873-1879 ◽

Author(s):

Wenbo Wan ◽

Haijun Lou ◽

Ying Xiao ◽

Xinnan Lin

Keyword(s):

Line Edge Roughness ◽

Roughness Effect ◽

Charge Plasma ◽

Edge Roughness ◽

Junctionless Transistor

Download Full-text

Strain Consideration of Charge Plasma Structure on Junctionless Transistor With Line Edge Roughness

2018 IEEE International Conference on Electron Devices and Solid State Circuits (EDSSC) ◽

10.1109/edssc.2018.8487066 ◽

2018 ◽

Author(s):

Wentao Li ◽

Haijun Lou ◽

Xinnan Lin

Keyword(s):

Plasma Structure ◽

Line Edge Roughness ◽

Charge Plasma ◽

Edge Roughness ◽

Junctionless Transistor

Download Full-text

Variation Investigation of Junction-less Transistor with Side-wall Charge-plasma Structure Induced by Line Edge Roughness

2020 IEEE 15th International Conference on Solid-State & Integrated Circuit Technology (ICSICT) ◽

10.1109/icsict49897.2020.9278349 ◽

2020 ◽

Author(s):

Kai Liu ◽

Hung-Chih Chin ◽

Haijun Lou ◽

Kuan-Chang Chang ◽

Xinnan Lin

Keyword(s):

Side Wall ◽

Plasma Structure ◽

Line Edge Roughness ◽

Charge Plasma ◽

Edge Roughness ◽

Download Full-text

A novel approach to simulate Fin-width Line Edge Roughness effect of FinFET performance

2010 IEEE International Conference of Electron Devices and Solid-State Circuits (EDSSC) ◽

10.1109/edssc.2010.5713678 ◽

2010 ◽

Author(s):

Xinjie Guo ◽

Shaodi Wang ◽

Chenyue Ma ◽

Chenfei Zhang ◽

Xinnan Lin ◽

...

Keyword(s):

Line Edge Roughness ◽

Roughness Effect ◽

Novel Approach ◽

Download Full-text

TCAD-Based Statistical Analysis and Modeling of Gate Line-Edge Roughness Effect on Nanoscale MOS Transistor Performance and Scaling

IEEE Transactions on Semiconductor Manufacturing ◽

10.1109/tsm.2004.826935 ◽

2004 ◽

Vol 17 (2) ◽

pp. 192-200 ◽

Author(s):

S.-D. Kim ◽

H. Wada ◽

J.C.S. Woo

Keyword(s):

Statistical Analysis ◽

Line Edge Roughness ◽

Roughness Effect ◽

Mos Transistor ◽

Download Full-text

The immunity of doping-less junctionless transistor variations including the line edge roughness

2016 IEEE International Conference on Electron Devices and Solid-State Circuits (EDSSC) ◽

10.1109/edssc.2016.7785211 ◽

2016 ◽

Author(s):

Wenbo Wan ◽

Haijun Lou ◽

Ying Xiao ◽

Xinnan Lin

Keyword(s):

Line Edge Roughness ◽

Edge Roughness ◽

Junctionless Transistor

Download Full-text

Modeling and Analysis of Gate Line Edge Roughness Effect on CMOS Scaling Towards Deep Nanoscale Gate Length

10.7567/ssdm.2002.a-2-2 ◽

2002 ◽

Author(s):

Seong-Dong Kim ◽

Sungkwon Hong ◽

Jae-Kwan Park ◽

Jason C. S. Woo

Keyword(s):

Gate Length ◽

Line Edge Roughness ◽

Roughness Effect ◽

Modeling And Analysis ◽

Cmos Scaling ◽

Download Full-text

Characterization of Line-Edge Roughness in Cu/Low-kInterconnect Pattern

Japanese Journal of Applied Physics ◽

10.1143/jjap.47.2501 ◽

2008 ◽

Vol 47 (4) ◽

pp. 2501-2505 ◽

Author(s):

Atsuko Yamaguchi ◽

Daisuke Ryuzaki ◽

Ken-ichi Takeda ◽

Jiro Yamamoto ◽

Hiroki Kawada ◽

...

Keyword(s):

Line Edge Roughness ◽

Download Full-text

Study of the acid-diffusion effect on line edge roughness using the edge roughness evaluation method

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1490392 ◽

2002 ◽

Vol 20 (4) ◽

pp. 1342 ◽

Author(s):

Masaki Yoshizawa ◽

Shigeru Moriya

Keyword(s):

Evaluation Method ◽

Line Edge Roughness ◽

Diffusion Effect ◽

Acid Diffusion ◽

Edge Roughness ◽

On Line ◽

Roughness Evaluation

Download Full-text

Interactions Between Line Edge Roughness and Random Dopant Fluctuation in Nonplanar Field-Effect Transistor Variability

IEEE Transactions on Electron Devices ◽

10.1109/ted.2013.2276072 ◽

2013 ◽

Vol 60 (10) ◽

pp. 3277-3284 ◽

Author(s):

Greg Leung ◽

Chi On Chui

Keyword(s):

Field Effect ◽

Field Effect Transistor ◽

Line Edge Roughness ◽

Random Dopant Fluctuation ◽

Edge Roughness ◽

Effect Transistor ◽

Download Full-text

Application of cellular neural networks in the measurement of line-width and line edge roughness

10.1117/12.676727 ◽

2006 ◽

Author(s):

Hong-bo Li ◽

Xue-zheng Zhao ◽

Wei Chu ◽

Ning Li

Keyword(s):

Neural Networks ◽

Cellular Neural Networks ◽

Line Edge Roughness ◽

Download Full-text