An Empirical Investigation on the Effect of Oxygen Vacancy in ZrO₂ Thin Film on the Frequency-Dependent Capacitance Degradation in the Metal-Insulator-Metal Capacitor
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2006 ◽
Vol 27
(9)
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pp. 740-742
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2016 ◽
Vol 27
(12)
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pp. 12527-12532
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2010 ◽
Vol 8
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pp. 012030
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Etch Properties of TiN Thin Film in Metal–Insulator–Metal Capacitor Using Inductively Coupled Plasma
2011 ◽
Vol 50
(8)
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pp. 08KC01
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