Etch Properties of TiN Thin Film in Metal–Insulator–Metal Capacitor Using Inductively Coupled Plasma

Japanese Journal of Applied Physics ◽

10.1143/jjap.50.08kc01 ◽

2011 ◽

Vol 50 (8) ◽

pp. 08KC01 ◽

Author(s):

Jung-Soo Park ◽

Jong-Chang Woo ◽

Chang-Il Kim

Keyword(s):

Thin Film ◽

Inductively Coupled Plasma ◽

Metal Insulator ◽

Inductively Coupled ◽

Metal Insulator Metal

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Etch Properties of TiN Thin Film in Metal–Insulator–Metal Capacitor Using Inductively Coupled Plasma

Japanese Journal of Applied Physics ◽

10.7567/jjap.50.08kc01 ◽

2011 ◽

Vol 50 (8S2) ◽

pp. 08KC01

Author(s):

Jung-Soo Park ◽

Jong-Chang Woo ◽

Chang-Il Kim

Keyword(s):

Thin Film ◽

Inductively Coupled Plasma ◽

Metal Insulator ◽

Inductively Coupled ◽

Metal Insulator Metal

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The dry etching property of TiO2 thin films using metal-insulator-metal capacitor in inductively coupled plasma system

Vacuum ◽

10.1016/j.vacuum.2012.05.016 ◽

2012 ◽

Vol 86 (12) ◽

pp. 2152-2157 ◽

Author(s):

Jong-Chang Woo ◽

Yoon-Soo Chun ◽

Young-Hee Joo ◽

Chang-II Kim

Keyword(s):

Inductively Coupled Plasma ◽

Dry Etching ◽

Tio2 Thin Films ◽

Plasma System ◽

Metal Insulator ◽

Inductively Coupled ◽

Metal Insulator Metal

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Effects of dielectric thickness and contact area on current–voltage characteristics of thin film metal–insulator–metal diodes

Thin Solid Films ◽

10.1016/j.tsf.2007.08.067 ◽

2008 ◽

Vol 516 (8) ◽

pp. 2244-2250 ◽

Author(s):

Subramanian Krishnan ◽

Elias Stefanakos ◽

Shekhar Bhansali

Keyword(s):

Thin Film ◽

Contact Area ◽

Metal Insulator ◽

Dielectric Thickness ◽

Current Voltage ◽

Metal Insulator Metal ◽

Current Voltage Characteristics

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$hboxBaSm_2hboxTi_4hboxO_12$Thin Film for High-Performance Metal–Insulator–Metal Capacitors

IEEE Electron Device Letters ◽

10.1109/led.2006.881085 ◽

2006 ◽

Vol 27 (9) ◽

pp. 740-742 ◽

Author(s):

B.J. Kim ◽

Y.H. Jeong ◽

B.Y. Jang ◽

J.B. Lim ◽

S. Nahm ◽

...

Keyword(s):

Thin Film ◽

High Performance ◽

Metal Insulator ◽

Metal Insulator Metal

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An Empirical Investigation on the Effect of Oxygen Vacancy in ZrO₂ Thin Film on the Frequency-Dependent Capacitance Degradation in the Metal-Insulator-Metal Capacitor

IEEE Transactions on Electron Devices ◽

10.1109/ted.2021.3110837 ◽

2021 ◽

pp. 1-5

Author(s):

Dong Hee Han ◽

Seungwoo Lee ◽

Ji Hyeon Hwang ◽

Youngjin Kim ◽

Marceline Bonvalot ◽

...

Keyword(s):

Thin Film ◽

Oxygen Vacancy ◽

Empirical Investigation ◽

Metal Insulator ◽

Frequency Dependent ◽

Metal Insulator Metal ◽

Effect Of Oxygen

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Atomic Layer Deposition of High-k and Nanolaminate Dielectrics for Transparent Thin Film Transistors and Metal/Insulator/Metal Tunnel Diodes

ECS Meeting Abstracts ◽

10.1149/ma2011-01/22/1369 ◽

2011 ◽

Keyword(s):

Thin Film ◽

Atomic Layer Deposition ◽

Thin Film Transistors ◽

Atomic Layer ◽

Tunnel Diodes ◽

Metal Insulator ◽

Layer Deposition ◽

High K ◽

Metal Insulator Metal

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Preparation of a ‐ SiN x Thin Film with Low Hydrogen Content by Inductively Coupled Plasma Enhanced Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.1838318 ◽

1998 ◽

Vol 145 (2) ◽

pp. 652-658 ◽

Author(s):

Sang‐Soo Han ◽

Byung‐Hyuk Jun ◽

Kwangsoo No ◽

Byeong‐Soo Bae

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Hydrogen Content ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Inductively Coupled

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Effects of growth variables on the properties of single crystalline ZnO thin film grown by inductively coupled plasma metal organic chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2009.01.008 ◽

2009 ◽

Vol 517 (15) ◽

pp. 4432-4435 ◽

Author(s):

Ju-Hoon Park ◽

Chang-Bae Lee ◽

Il-Soo Kim ◽

Seong-Joo Jang ◽

Byung-Teak Lee

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Organic Chemical ◽

Zno Thin Film ◽

Inductively Coupled ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Etch Characteristics of Cu Thin Film Using Inductively Coupled Plasma of Non-Greenhouse Gases

ECS Meeting Abstracts ◽

10.1149/ma2018-01/46/2652 ◽

2018 ◽

Keyword(s):

Thin Film ◽

Greenhouse Gases ◽

Inductively Coupled Plasma ◽

Inductively Coupled ◽

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Deposition of thin film ceramics and ceramic nanocomposites by inductively coupled plasma assisted hybrid chemical/physical vapor deposition

ICOPS 2000. IEEE Conference Record - Abstracts. 27th IEEE International Conference on Plasma Science (Cat. No.00CH37087) ◽

10.1109/plasma.2000.854553 ◽

2005 ◽

Author(s):

Wen Jin Meng ◽

Bao Feng ◽

Dong Mei Cao

Keyword(s):

Thin Film ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Physical Vapor Deposition ◽

Inductively Coupled ◽

Ceramic Nanocomposites

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