Removal of chemical–mechanical polishing-induced damage layer in single crystal La[sub 3]Ga[sub 5]SiO[sub 14] by inductively coupled plasma etching

2005 ◽  
Vol 23 (5) ◽  
pp. 2236 ◽  
Author(s):  
Hyun Cho ◽  
S. J. Pearton
Keyword(s):  
Single Crystal ◽  
Plasma Etching ◽  
Chemical Mechanical Polishing ◽  
Inductively Coupled Plasma ◽  
Mechanical Polishing ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled ◽  
Damage Layer

Optimum inductively coupled plasma etching of fused silica to remove subsurface damage layer

2015 ◽  
Vol 355 ◽  
pp. 1180-1185 ◽  
Author(s):  
Xiaolong Jiang ◽  
Ying Liu ◽  
Zhengkun Liu ◽  
Keqiang Qiu ◽  
Xiangdong Xu ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Fused Silica ◽  
Subsurface Damage ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled ◽  
Damage Layer

Inductively coupled plasma etching for delineation of InAs/GaSb pixels

2012 ◽  
Author(s):  
Jean Nguyen ◽  
John Gill ◽  
Sir B. Rafol ◽  
Alexander Soibel ◽  
Arezou Khoshakhlagh ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled

Inductively coupled plasma etching of HgCdTe using a CH4-based mixture

2005 ◽  
Vol 34 (6) ◽  
pp. 740-745 ◽  
Author(s):  
E. Laffosse ◽  
J. Baylet ◽  
J. P. Chamonal ◽  
G. Destefanis ◽  
G. Cartry ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled
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