Effects of magnetic flux density and substrate bias voltage on Ni films prepared on a flexible substrate material using unbalanced magnetron sputtering assisted by inductively coupled plasma

2014 ◽  
Vol 32 (2) ◽  
pp. 02B104 ◽  
Author(s):  
Tatsunori Koda ◽  
Hiroshi Toyota
Keyword(s):  
Magnetic Flux ◽  
Inductively Coupled Plasma ◽  
Flexible Substrate ◽  
Substrate Material ◽  
Magnetic Flux Density ◽  
Substrate Bias ◽  
Substrate Bias Voltage ◽  
Inductively Coupled ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron

Influence of the Substrate Bias Voltage on the Structure of Rutile TiO2 Films Prepared by Dual Cathode DC Unbalanced Magnetron Sputtering

2012 ◽  
Vol 506 ◽  
pp. 82-85
Author(s):  
P. Kasemanankul ◽  
N. Witit-Anun ◽  
S. Chaiyakun ◽  
P. Limsuwan
Keyword(s):  
Crystal Structure ◽  
Magnetron Sputtering ◽  
Grazing Incidence ◽  
Substrate Bias ◽  
Substrate Bias Voltage ◽  
Force Microscopy ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Xrd Patterns ◽  
Deposited Films

Rutile TiO2 films are normally used as biomaterial that synthesized on unheated stainless steel type 316L and glass slide substrates by dual cathode DC unbalanced magnetron sputtering. The influence of the substrate bias voltages (Vsb), from 0 V to-150V, on the structure of the as-deposited films was investigated. The crystal structure was characterized by grazing-incidence X-ray diffraction (GIXRD) technique, the films thickness and surface morphology was evaluated by atomic force microscopy (AFM) technique, respectively. The results show that the as-deposited films were transparent and have high transmittance in visible regions. The crystal structure of as-deposited films show the XRD patterns of rutile (110) with Vsb at 0V and shifted to rutile (101) with increasing Vsb. The films roughness (Rrms) and the thickness were 3.0 nm to 5.7 nm and 420 nm to 442 nm, respectively.

Sign in / Sign up

Export Citation Format

Share Document